Modeling the flux of high energy negative ions during reactive magnetron sputtering

Abstract

Articles you may be interested inInvestigation of ionized metal flux in enhanced high power impulse magnetron sputtering discharges J. Appl. Phys. 115, 153301 (2014); 10.1063/1.4871635 Current-voltage-time characteristics of the reactive Ar/O2 high power impulse magnetron sputtering dischargeThe negative ion flux during reactive sputtering from planar and rotating cylindrical magnetrons has been studied. Energy resolved mass spectrometry was used to measure the energy and mass distribution of the negative ions. Also the angular distribution of the high energy ions was characterized for planar as well as for rotating cylindrical magnetrons. Besides these measurements, a binary collision Monte Carlo simulation code, SiMTRA, was adapted in order to simulate the energy, mass, and angular distribution of the high energy negative ions. All simulated distributions, for both planar and rotating cylindrical magnetrons, were in excellent correspondence with the experimental observations. Also a model for the amount of high energy negative O − ions was proposed. Indeed, the logarithm of the amount of high energy negative O − ions is shown to be related to the secondary electron emission yield of the oxide target, and these two parameters are known to be related to the work function. The SiMTRA simulations, in combination with knowledge of the work function or secondary electron emission yield of the target, allow modeling the flux of high energy negative ions during reactive magnetron sputtering.

Production of negative ions on graphite surface in H2/D2 plasmas: Experiments and srim calculations

“…On the contrary, few works deal with negative ion surface-production in cesium-free plasmas 41,42,43,44,45,46,47,48,49,50,51,52,53,54,55,56,57,58,59,60,61,62,63,64,65,66,67,68 . Most of them are related to the industrial process of layer deposition by sputtering and concern mainly oxygen negative ions [44][45][46][47][48][49][50][51][52][53][54][55][56][57][58][59]. H-surface-production in Cs-free plasmas has been mainly studied in 59, 60, 61, 62 (carbon materials), 63 (stainless steel), and 64,65,66,67,68 (barium surfaces).…”

Synthesis of yttrium silicates by annealing r.f. sputtered glassy coatings

“…Consequently, formation of energetic negative oxygen ions appears likely also during sputtering from an Y 2 Si 2 O 7 target. Moreover, indication of YO and YO 2 [29,30] and SiO, SiO 2 , and SiO 3 [31] cluster formation was reported, which might be r.f. power dependent.…”

“…The Ba and Cu depletion in the thin films was suggested to be caused by resputtering by negative O À and O 2 À ions formed at the target surface and accelerated by the target potential. The formation of energetic negative oxygen ions during sputtering of Y [29,30] and Si [31] in a reactive Ar/O 2 was reported. Consequently, formation of energetic negative oxygen ions appears likely also during sputtering from an Y 2 Si 2 O 7 target.…”

Study on reactive sputtering of yttrium oxide: Process and thin film properties

“…It is interesting to notice that the monoclinic phase appears at mild oxygen pressure. Although the real mechanism for the observed results is still under investigation, the role of negative ion bombardment, relative to the deposition rate, can be expected to play a role [39]. Indeed, some authors reported on the presence of the monoclinic phase due to negative ion bombardment during the deposition of erbium sesquioxide [40].…”