Modeling of two-photon polymerization in the strong-pulse regime

Sun, Mingman; Cheng, He; Golvari, Pooria; Kuebler, Stephen M.; Yu, Xiaoming; Zhang, Meng

doi:10.1016/j.addma.2022.103241

Cited by 4 publications

(2 citation statements)

References 32 publications

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“…The scaling law of voxel can be obtained by considering the polymerization kinetics with highly confined spatiotemporal scales to investigate the time and energy required for voxel with different laser irradiation (Figure 5a,b). [252][253][254][255]364,365] Generally with short exposure time, the laser power is scaled with the inverse square root of the exposure time at the polymerization threshold, while for longer exposure time, Schwarzschild effect needs to be considered regarding of the diffusion of photoinitiator molecules and oxygen. [366] The proximity effect of voxel arrays can be calibrated by considering the point spread function overlap and diffusion processes.…”

Section: High-quality Fabrication From Voxel To Bulkmentioning

confidence: 99%

Two‐Photon Polymerization Lithography for Optics and Photonics: Fundamentals, Materials, Technologies, and Applications

Wang

Zhang

Ladika

et al. 2023

Adv Funct Materials

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The rapid development of additive manufacturing has fueled a revolution in various research fields and industrial applications. Among the myriad of advanced three-dimensional printing techniques, two-photon polymerization lithography (TPL) uniquely offers a significant electron microscope (SEM) images of SMP structures before and after programming and after recovery, respectively. Reproduced under terms of the CC-BY license. [114] Copyright 2021, The Authors, published by Nature Publishing Group. b) Stiff SMPs for high-resolution reversible nanophotonics. I-II) The deformed and recovered nanopillars under optical microscope and SEM, respectively. Reproduced with permission. [115] Copyright 2022, American Chemical Society. c) Vapor-responsive photonic arrays. I-IV) Optical image of a grid array in air, in water vapors ~ 20 s, saturation with water vapors ~ 88s, and after the gas flow stopped, respectively.Reproduced under terms of the CC-BY license. [116] Copyright 2021, The Authors, published by Royal Society of Chemistry. d) SEM image of a 40-layer face-cantered-cubic photonic structure printed by SU-8. Reproduced with permission. [117] Copyright 2004, Nature Publishing Group. e) SEM image of helices with an axial pitch of 800 nm and a radius of 800 nm fabricated by the two-step absorption photoresist. Reproduced with permission. [118]

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Section: High-quality Fabrication From Voxel To Bulkmentioning

confidence: 99%

Two‐Photon Polymerization Lithography for Optics and Photonics: Fundamentals, Materials, Technologies, and Applications

Wang

Zhang

Ladika

et al. 2023

Adv Funct Materials

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“…The most likely process among 𝑁photons, is Two-Photon Absorption (TPA or 2PA). When a sufficient number of excited molecules are produced within a confined space, they can cross-link via a chain reaction and create a solid structure [11][12][13]; this is followed by a development step to remove the unpolymerized resin. While TPA is proportional to the square of light intensity Fig.…”

Section: Introductionmentioning

confidence: 99%

X-photon 3D lithography by fs-oscillators: wavelength-independent and photoinitiator-free

Ladika,

Butkus,

Melissinaki

et al. 2023

Preprint

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Laser direct writing employing multi-photon 3D polymerisation is a scientific and industrial tool used in various fields such as micro-optics, medicine, metamaterials, programmable materials, etc., due to the fusion of high-throughput and fine features down to hundreds of nm. Some limitations of technology applicability emerge from photo-resin properties, however any material modifications can strongly affect its printability, as photoexcitation conditions alter as well. Here we present wavelength-independent 3D polymerisation using low peak power laser oscillators. High pulse repetition rate and fast laser direct writing was employed for advancing additive manufacturing out of the SZ2080TM photo-resist without any photo-initiator. Wavelengths of 517 nm, 780 nm, and 1035 nm are shown to be suitable for producing 300 nm polymerized features even at high – up to 100 mm/s – writing speeds. Variation of organic-inorganic ratio in hybrid material results in shift and decrease of the dynamic fabrication window, yet not prohibiting the photo-structuring. Controlled energy deposition per focal volume is achieved due to localized heating enabling efficient 3D printing. Such spatio-selective photo-chemical cross-linking widens optical manufacturing capacity of non-photo-sensitive materials.

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High‐Quality Micropattern Printing by Complex‐Amplitude Modulation Holographic Femtosecond Laser

Li,

Jiang,

Wang

et al. 2024

Advanced Optical Materials

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Holographic femtosecond laser printing technology is widely used in the fabrication of micropatterns because of its high efficiency and flexibility. However, speckle noise and energy fluctuations limit the quality of the printed structure. In this study, an improved complex‐amplitude modulation holographic femtosecond laser printing method for high‐quality micropattern fabrication is proposed. The holographic light field is divided into a signal area and a surrounding noise area. To improve laser uniformity, phase modulation is applied in the signal region to eliminate the speckle noise caused by unconstrained phase interference, and weighted amplitude modulation is introduced in the signal area to improve the calculation accuracy. To precisely control laser energy density, weighted energy efficiency modulation is introduced in the noise region to disperse the energy that exceeds the material damage threshold. Under the synergistic control of laser uniformity and energy density, high‐quality micro‐pattern structures are printed efficiently. A high‐quality millimeter‐sized multifocal zone plate with micron accuracy is fabricated with the splicing printing method, demonstrating the potential of micropattern processing and the fabrication of functional devices such as binary optics.

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Modeling of two-photon polymerization in the strong-pulse regime

Cited by 4 publications

References 32 publications

Two‐Photon Polymerization Lithography for Optics and Photonics: Fundamentals, Materials, Technologies, and Applications

Two‐Photon Polymerization Lithography for Optics and Photonics: Fundamentals, Materials, Technologies, and Applications

X-photon 3D lithography by fs-oscillators: wavelength-independent and photoinitiator-free

High‐Quality Micropattern Printing by Complex‐Amplitude Modulation Holographic Femtosecond Laser

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