Modeling of thermal processes in magnetrons with single hot target and “sandwich-target”

Kozin, A A; Шаповалов, В. М.

doi:10.1016/j.surfcoat.2018.12.070

Cited by 20 publications

(5 citation statements)

References 28 publications

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“…are not fully explained at that time. At such low specific power, evaporation mechanism is negligible according [40] and the EQP measurement supposing that low energy species are detectable. Our model indicates that the flux of evaporated atoms is 6 10 14 at/cm².s, whereas the one of sputtered atoms is 10 17 at/cm².s at 150 W (and 1010°C), as shown on Figure 8c.…”

Section: Sputtering Process and Deposition Ratementioning

confidence: 95%

“…Second, high-energy species which are generally produced at target in conventional (cold) magnetron sputtering transfer their energy to growing film and modify its physical properties. The influence of target temperature on flux and on the energy of these species has never been measured even if research groups investigated the influence of hot target during sputtering [40,41] and pointed out the fact that this hot process should induce lower energy ejected species (due to evaporation mechanism).…”

Section: Introductionmentioning

confidence: 99%

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Hot target magnetron sputtering process: Effect of infrared radiation on the deposition of titanium and titanium oxide thin films

Graillot-Vuillecot

Thomann

Lecas

et al. 2020

Vacuum

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Titanium-based thin films are synthesized by the magnetron sputtering of a titanium target in pure argon or in a mixture of argon and oxygen (reactive regime) in three experimental configurations: a hot target configuration for which the target is thermally disconnected from the cooled magnetron body, a cold/conventional target configuration, and a cold target configuration with an additional infrared source introduced in the chamber to understand the role of the radiation on thin film properties. In hot configuration, the target temperature and its emissivity are measured and compared to a 0D steady state model taking into account the main different cooling mechanisms. IR radiations constitute the major part of the total energy deposited on the substrate during hot target magnetron sputtering, whereas an increase of target temperature allows a rise of sputtered Ti and Ti + species fluxes and slightly affect their kinetic energy. In reactive regime, the obtained films are constituted of polycrystalline anatase TiO2, and an increase of target/IR source temperature leads to an improvement of crystallinity. In pure argon, hot configuration seems to enhance its porosity, induces columns exhibiting sharp-features, slightly modifies its crystalline properties and helps to decrease internal compressive stress.

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Section: Sputtering Process and Deposition Ratementioning

confidence: 95%

Section: Introductionmentioning

confidence: 99%

Hot target magnetron sputtering process: Effect of infrared radiation on the deposition of titanium and titanium oxide thin films

Graillot-Vuillecot

Thomann

Lecas

et al. 2020

Vacuum

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“…Но они дают значительную погрешность, поскольку пирометром интегрирует оптический спектр разряда в ИК-области, который представляет собой комбинацию спектров испускания тлеющего разряда и теплового излучения мишени. Зависимость температуры мишени от плотности тока разряда, которая была использована при подготовке настоящей работы, определяли по методике, использованной в [35,36]. Методика основана на измерении оптических спектров разряда.…”

Section: анализ реактивного распыления горячей титановой мишени в среunclassified

Горячая Мишень. Физико-Химическая Модель Реактивного Распыления

Шаповалов¹

2019

Журнал Технической Физики

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Получила развитие неизотермическая физико-химическая модель реактивного распыления. Новый вариант модели описывает распыление горячей металлической мишени в смеси аргона и одного реактивного газа. Синтез пленки на всех поверхностях вакуумной камеры задан в форме поверхностной химической реакции. Для математического описания реакции использован основной постулат химической кинетики с учетом уравнения изотермы Ленгмюра и уравнения Аррениуса в неизотермических условиях. Зависимость температуры мишени от плотности тока разряда определена по результатам измерения спектров разряда в ближнем ИК-диапазоне. Для аналитического описания модели предложена система из восьми алгебраических уравнений. С ее помощью выполнен анализ влияния плотности тока и расхода реактивного газа на процесс реактивного распыления горячей титановой мишени в смеси аргон + азот при плотности тока 25−600 A/m 2 . Установлено, что разогрев мишени смещает точки изменения режимов работы мишени в область меньших расходов азота и уменьшает ширину петли гистерезиса по сравнению с холодной мишенью. При этом влияние испарения мишени на процесс начинает проявляться при плотности тока более 400 A/m 2 .

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“…For the time being, several parameters have already been studied in HMS discharges (deposition rate [8,11], target [17,22] and electron [5,9] temperatures, energy flux [23], plasma density [5,24], etc), including several simulations [25][26][27]. However, most of the works are focused on evaporation/sublimation phenomena, while the HMS discharge with a refractory material (e.g.…”

Section: Introductionmentioning

confidence: 99%

Ion formation in thermionic-emission-assisted hot magnetron sputtering discharge

Leonova

Konstantinidis

Britun

2023

Plasma Sources Sci. Technol.

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We report an abrupt Nb ion formation in a DC (direct current) hot magnetron sputtering discharge as a result of target temperature increase to a certain point (1900 K in our case). The effect is explained by a significant thermionic emission from the target surface, leading to an enhanced electron impact ionization in the plasma volume. The phenomenon is especially pronounced for Nb (refractory material), for which higher target temperatures can be reached. The volume density mapping is undertaken for Nb neutrals and ions (using laser-based spectroscopy) emphasizing the found effects.

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Modeling of thermal processes in magnetrons with single hot target and “sandwich-target”

Cited by 20 publications

References 28 publications

Hot target magnetron sputtering process: Effect of infrared radiation on the deposition of titanium and titanium oxide thin films

Hot target magnetron sputtering process: Effect of infrared radiation on the deposition of titanium and titanium oxide thin films

Горячая Мишень. Физико-Химическая Модель Реактивного Распыления

Ion formation in thermionic-emission-assisted hot magnetron sputtering discharge

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