Modeling of substrate surface temperature distribution during hot-filament assisted diamond deposition

Tankala, K.; DebRoy, T.; Yarbrough, Walter A.; Robinson, C. Jane

doi:10.1016/0925-9635(92)90092-3

Cited by 4 publications

(1 citation statement)

References 18 publications

(8 reference statements)

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The quality of the diamond films over a large area degraded if the substrate temperature did not homogeneously distributed. A few of efforts were made to study the temperature space field to obtain the good diamond films [2][3][4][5] . In this paper, based on the principle of heat transfer, the mathematical model was founded and the influence of filament parameters on substrate temperature was systematically studied.…”

Section: Introductionmentioning

confidence: 99%

Simulation of substrate temperature in HFCVD diamond thin films

Wang

Yin

2009

4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technolo

View full text Add to dashboard Cite

The substrate temperature is one of the most important parameters for the synthesis of high quality diamond thin films in hot filament chemical vapor deposition (HFCVD) system. Based on the principle of heat transfer, the substrate temperature is calculated in the single hot filament system, the influence of filament height, filament diameter and filament length on substrate temperature are also discussed. Results show that the substrate temperatures vary with the space position. In the direction of parallel with the filament, the substrate temperatures vary smoothly, but, in the vertical direction of the filament, the substrate temperatures change acutely. When H=8mm, L=7cm and d f =0.5mm, the substrate temperatures are well-distributed, this will give the support of some technique parameters for the growth of large area HFCVD diamond thin films.

show abstract

Section: Introductionmentioning

confidence: 99%