Abstract:Introductionsignificant, Cause of device performance variation [1]- [7]. Stress induced from shallow trench isolation is found to' influence seriously the mobility and thus the l&OD model for Stress Effect Mechanical stress effect has become a Stress effect could be explained by the mobility change for different layouts. The relationship is :Of the bulk ,where ku is a L-dependent coefficient and SNSB devices [11-[41. The impact Of effect On are defined in the inserted layout of Fig.1, Fig.4 devices are also c… Show more
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