Model of point-of-use plasma abatement of perfluorinated compounds with an inductively coupled plasma

Abstract

Articles you may be interested inCompensation for transient chamber wall condition using real-time plasma density feedback control in an inductively coupled plasma etcher Inductively coupled, point-of-use plasma abatement of perfluorinated compounds and hydrofluorinated compounds from etch processes utilizing O 2 and H 2 O as additive gases Point-of-use plasma abatement ͑PPA͒ has been proposed as one way to eliminate perfluorinated compound ͑PFC͒ emission from various tools used in integrated circuit manufacturing. PPA employs a high density plasma between the process tool turbomolecular pump and the backing pump. Oxygen is added to the process tool effluent upstream of the PPA tool. The mixture of oxygen and PFC-containing tool effluent enters the PPA tool and the PFCs are converted to products that can be scrubbed downstream of the backing pump. In this article, we present a model for the PPA tool operation, illustrating the principles with a mixture of C 2 F 6 /O 2 . A plasma model is coupled to a neutral transport and reaction model, including electron-impact molecular dissociation and subsequent gas phase chemistry.

Impact of gas heating in inductively coupled plasmas

“…pu in the mass conservation was approximated by a relaxation term t:..{J1 Tres. Finally, Fiala et al 27 included mass and momentum equations for the neutral species but did not solve the neutral energy conservation. All of this research neglected what is now seen as a significant effect in plasma processing, that of neutral gas heating.…”

High-Resolution Fourier Transform and Diode–Laser Spectroscopy of the ν6 Fundamental of C2F6 and Associated Hot Bands

“…However, they do not include the perturbed series or its effect on the series nearby in energy. The most obvious effect of the omission is that the simulated series H 4,5 (Fig. 4) is stronger than the measured one (Fig.…”

“…The main hot-band structure visible in the spectrum is due to the many thermally populated torsional levels of 4 . This can be clearly seen in Fig.…”

“…The present molecule, perfluoroethane (C 2 F 6 ), has a very low wavenumber torsional vibration, 4 , of about 67 cm Ϫ1 , so that its spectrum has a large number of hot bands built upon multiples of 67 cm Ϫ1 . Highwood and Shine have pointed out that although the integrated intensity of all the hot bands derived from a parent band should be approximately constant with temperature (2), the change in shape of the rotational envelope may lead to a significant change in the radiative forcing (3).…”

“…To investigate the hot-band spectra and rotational profiles over as large a range as possible, we have combined FTIR spectroscopy from room temperature down to 77 K (the limit of a collisionally cooled cell cooled by liquid nitrogen) with diodelaser jet spectroscopy from 10 K upward. C 2 F 6 is emitted into the atmosphere solely as an anthropogenic gas, produced particularly in aluminum processing and semiconductor manufacturing (4). Its lifetime in the atmosphere has been calculated as Ն10 000 years (5).…”