2022
DOI: 10.1016/j.jallcom.2022.166173
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MOCVD growth and thermal stability analysis of 1.2 µm InGaAs/GaAs multi quantum well structure

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Cited by 8 publications
(2 citation statements)
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“…InGaAs is selected as the quantum well material to achieve 1083 nm. Indium with a larger size can strongly hinder the propagation of epitaxy defects and effectively suppress the growth rate of dark line defects [23]. InGaAs and GaAs may have a lattice distortion greater than 2% to achieve a 1 µm light emission, and dislocation defects are prone to occur in this case [24].…”
Section: Laser Design Simulation and Fabricationmentioning
confidence: 99%
“…InGaAs is selected as the quantum well material to achieve 1083 nm. Indium with a larger size can strongly hinder the propagation of epitaxy defects and effectively suppress the growth rate of dark line defects [23]. InGaAs and GaAs may have a lattice distortion greater than 2% to achieve a 1 µm light emission, and dislocation defects are prone to occur in this case [24].…”
Section: Laser Design Simulation and Fabricationmentioning
confidence: 99%
“…Moreover, its bandgap energy can be tuned to the range appropriate for several applications, such as long wavelength emitters [ 17 ], detectors [ 18 ], and spintronic-related devices [ 17 ], by alloying it with other elements such as In, Al, Sb, and N to form InGaAs, AlGaAs, GaAsSb, and GaAsN, respectively, etc. These ternary alloys, InGaAs, AlGaAs, GaAsSb, and GaAsN, have been successfully grown by metal-organic chemical vapor deposition (MOCVD) [ 19 , 20 , 21 , 22 ] and by molecular beam epitaxy (MBE) [ 23 , 24 , 25 , 26 ]. Among its diverse applications, GaAs-based material can be used as a substrate for the epitaxial growth technology of other III-V semiconductors, including InGaAs, InGaN, GaAsN, and others.…”
Section: Introductionmentioning
confidence: 99%