2009
DOI: 10.1016/j.spmi.2009.09.008
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Mobility enhancement of 2DEG in MOVPE-grown AlGaN/AlN/GaN HEMT structure using vicinal (0 0 0 1) sapphire

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Cited by 14 publications
(8 citation statements)
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“…These problems can be overcome by utilizing a thin layer of aluminium nitride (AlN) as Interlayer (IL) improves the heterostructure interface quality as well as reduces dislocations and alloy disorders during the growth of AlGaN-based HEMT heterostructures. And also, AlN-IL acts as a barrier by minimizing the charge carrier tunneling [5,9,[11][12][13][14][15][16][17]. Based on earlier reports, we have reported a better quality AlGaN layers grown on GaN/sapphire templates using MOCVD [18][19][20].…”
Section: Introductionmentioning
confidence: 77%
See 1 more Smart Citation
“…These problems can be overcome by utilizing a thin layer of aluminium nitride (AlN) as Interlayer (IL) improves the heterostructure interface quality as well as reduces dislocations and alloy disorders during the growth of AlGaN-based HEMT heterostructures. And also, AlN-IL acts as a barrier by minimizing the charge carrier tunneling [5,9,[11][12][13][14][15][16][17]. Based on earlier reports, we have reported a better quality AlGaN layers grown on GaN/sapphire templates using MOCVD [18][19][20].…”
Section: Introductionmentioning
confidence: 77%
“…In addition, the 2DEG sheet concentration of samples I, III and IV is almost independent of temperature. In contrast, sample II has a temperature range from 200 K -350 K, which suggests the involvement of some additional channel conductivity [14]. These results directly indicate that the thin AlN interfacial layer effectively suppresses carrier penetration into the AlGaN layer by increasing conduction band offset (Ec) and enhances the confinement of the 2DEG in the GaN channel of the AlGaN/GaN HEMT structures.…”
Section: Table 1 Structural Properties Of Algan/gan Heterostructures ...mentioning
confidence: 88%
“…Comparison curves of the mobility model (solid lines) with experimental data (symbols) at different temperature ranges: a) low temperatures [ 41,45 ] and b) high temperatures. [ 46 ] …”
Section: Model Descriptionmentioning
confidence: 99%
“…As shown in Figure 3, the mobility model shown in Equation ( 12) is verified by the measurements at different temperatures in refs. [41,45,46].…”
Section: Charge Transportationmentioning
confidence: 99%
“…III-nitride, wide bandgap, semiconductor materials are important for microelectronics applications, such as high electron mobility transistors (HEMTs) which consist of complex heterostructures of compound nitride materials (Wu et al, 2001; Mishra et al, 2002; Hu et al, 2009; Liu et al, 2017). To optimize device performance, which relies on accurate stoichiometry and interfacial quality, the structure and chemistry of the heterostructure need to be understood at the atomic level.…”
Section: Introductionmentioning
confidence: 99%