The
functionality and performance of devices based on atomically
thin two-dimensional (2D) materials strongly depend on the quality
of the employed 2D material. Although molybdenum disulfide (MoS2) is an excellent candidate for future applications in nanoelectronics,
MoS2 films have not yet reached the level of purity achieved
in silicon technologies. At present, the formation of small and extended
defects in the material is inevitable during the growth process, and
this has a non-negligible impact on the electronic properties of MoS2. Furthermore, defects are also thought to affect nontrivially
the resistance at the MoS2–metal contact and the
injection of carriers. In this work, we systematically and thoroughly
assess the impact of some of the most commonly occurring defects in
MoS2 (such as vacancies, substitutions, and grain boundaries)
not only from the point of view of the material’s properties
but also by looking at MoS2–metal contacts. To do
so, we carry out ab initio computer simulations in the density functional
theory (DFT) framework coupled with surface simulations based on the
Green’s function formalism. Our simulation approach allows
us to obtain more realistic models of MoS2 interfaces with
Au. Moreover, this is the first theoretical study in which the effect
of grain boundaries on the MoS2–Au contact properties
is explored. Results suggest that S vacancies have a detrimental impact
on the quality of the metal contacts, whereas Mo vacancies strongly
improve the electron injection from the metal to MoS2.
Antisite Mo defects also increase the electron injection rate by acting
as “conductive bridges” between the Au electrode and
the 2D material. Finally, each of the grain boundaries considered
here improves the quality of the contact. We expect our study to provide
the necessary theoretical foundation for the design of MoS2–metal contacts with suitable characteristics.