“…Even for the most canonical DFS (Ga,Mn)As, mostly low-temperature molecular beam epitaxy (LT-MBE) has been employed for its epitaxial film preparation [ 4 , 7 , 8 ], which significantly prohibited the development of DFSs. Moreover, such an obstacle threatens the most conventional technique of semiconductor modification, i.e., co-doping which is productive to present new physics [ 9 , 10 , 11 , 12 , 13 , 14 ]. However, ion implantation followed by the pulsed laser melting method provides an alternative solution to this problem due to its second non-equilibrium grown essence, and therefore, it has been used in several hyper-doping cases in which some are even impossible to approach by LT-MBE [ 15 , 16 , 17 ].…”