<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mi>p</mml:mi><mml:mo>(</mml:mo><mml:mn>1</mml:mn><mml:mn /><mml:mo>×</mml:mo><mml:mn>1</mml:mn><mml:mo>)</mml:mo></mml:math>to<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mi>c</mml:mi><mml:mo>(</mml:mo><mml:mn>4</mml:mn><mml:mn /><mml:mo>×</mml:mo><mml:mn>8</mml:mn><mml:mo>)</mml:mo></mml:math>periodicity change in ultrathin iron silicide on<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML

Hajjar, S.; Garreau, G.; Pelletier, S.; Bolmont, D.; Pirri, C.

doi:10.1103/physrevb.68.033302

Cited by 22 publications

(38 citation statements)

References 25 publications

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“…Figure 1(a) shows a p(2×2) structure obtained at the annealing temperature of 700 K. With increasing the annealing temperature upto 900 K, the p(2×2) structure transformed to the c(8×4) silicide [ Fig. 1(b)], which is in good agreement with the previous reports [8,30,31]. With further increase of the annealing temperature, the c(8×4) structure gradually changed to the (7×7) structure, which indicates the recovery of the clean Si(111) surface by the diffusion of Fe into deeper bulk.…”

Section: A Iron Silicide Formationsupporting

confidence: 88%

“…The investigation of the interfacial MDL for ultrathin Fe films on iron silicides and Si(111)-7×7 surfaces plays an important role for the heterojunction. As previously reported [30,31], the high-quality epitaxial ultrathin iron silicides can be obtained on Si(111). These iron silicides are thermally stable, and could be better candidates for the suppression of the interfacial MDL of Fe-Si alloy.…”

Section: Introductionsupporting

confidence: 74%

“…Our results indicate that the c(8×4) Fe silicide surface prevents further silicide formation. The c(8×4) surface has a higher disintegration temperature than p(2×2) [30,31]. The thermal stability of the c(4×8) structure is noticeable even when compared with thick Fe silicide (4 ML) with a p(2×2) structure [30].…”

Section: Discussionmentioning

confidence: 99%

“…Ultrathin iron silicides were prepared on Si(111) surface in the same way as previous reports [30,31]. 1.7 ML Fe was deposited on Si(111) at RT, which was subsequently annealed.…”

Section: A Iron Silicide Formationmentioning

confidence: 99%

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Investigation of Magnetic Dead Layer on Iron Silicide Surfaces

Kibria

Nomitsu

Nakagawa

et al. 2018

e-J. Surf. Sci. Nanotech.

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We report the magnetic dead layer at the interfaces between Fe and Si(111) surfaces. We prepared two ultrathin iron-silicides, c(8×4) prepared at 900 K and p(2×2) at 700 K, and clean reconstructed 7×7 surface for the silicon templates. By using magneto-optical Kerr effect, we found that at room temperature the ferromagnetic order appears at 5.5 ML, 8.2 ML, and 10.9 ML for Fe/c(8×4) silicide, Fe/p(2×2) silicide, and Fe/Si(111)-7×7 surface, respectively. From the thickness dependent magnetization measurements, we decided the magnetic dead layer for Fe/c(8×4) silicide, Fe/p(2×2) silicide, and Fe/Si(111)-7×7 to be 3.0 ML, 5.0 ML, and 7.5 ML, respectively. Our results indicate that the c(8×4) iron silicide surface prevents further silicide formation more effectively than the p(2×2) silicide and Si(111)-7×7 surface.

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Section: A Iron Silicide Formationsupporting

confidence: 88%

Section: Introductionsupporting

confidence: 74%

Section: Discussionmentioning

confidence: 99%

“…Ultrathin iron silicides were prepared on Si(111) surface in the same way as previous reports [30,31]. 1.7 ML Fe was deposited on Si(111) at RT, which was subsequently annealed.…”

Section: A Iron Silicide Formationmentioning

confidence: 99%

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Investigation of Magnetic Dead Layer on Iron Silicide Surfaces

Kibria

Nomitsu

Nakagawa

et al. 2018

e-J. Surf. Sci. Nanotech.

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“…The magnetic anisotropy has been measured ex situ with the recent Transversely Biased Initial Inverse Susceptibility and Torque (TBIIST) method described in details in the reference [7]. Prior to Fe deposition at room temperature, an ultra thin and atomically flat iron silicide layer with c(4x8) periodicity was grown on the Si(111) wafer [8]. This template layer prevents the diffusion of Si into the Fe layer and improves the epitaxy of the Fe…”

mentioning

confidence: 99%

Magnetic anisotropy versus morphology in Fe films deposited on ultrathin iron silicides

Garreau

Bubendorff

Hajjar

et al. 2004

phys. stat. sol. (c)

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The correlation between growth and magnetic anisotropy of thin Fe films deposited on ultra thin iron silicide template grown on Si(111) is investigated by means of scanning tunnelling microscopy and magneto optical Kerr effect experiments. The morphology of the film strongly depends on the Fe beam orientation relative to the sample normal. Whereas the Fe clusters are randomly distributed at normal incidence, oblique evaporation leads to the formation of elongated Fe islands perpendicular to the Fe beam. These distinct growth modes lead to drastically different magnetic anisotropies. An in-plane six-fold anisotropy magnetic easy axis has been evidenced for films deposited at normal incidence. The films evaporated at oblique incidence show an uniaxial in-plane magnetic easy axis parallel to the Fe stripes. This uniaxial anisotropy originates from long-ranged dipolar interactions.It has been previously observed that an artificial in-plane uniaxial magnetic anisotropy can be induced in thin ferromagnetic films by different methods such as deposition on stepped substrate [1], grazingincidence deposition on flat substrate [2-5] or low-temperature grazing incidence ion sputtering after the deposition at normal incidence of the magnetic layer [6]. In the case of oblique incidence deposition of Fe films on MgO(001) substrate, two different interpretations have been proposed in the literature to explain this uniaxial in-plane magnetic anisotropy. On one hand, Durand [3] suggested that this anisotropy results from magneto-elastic effects due to an in-plane tetragonal distortion of the cubic Fe structure. On the other hand, Park [2] and Wolfe [5] proposed that this magnetic anisotropy originates from an anisotropic surface roughness. This last interpretation has been also suggested in the case of thin Co films deposited on Cu(001) [4].In this paper, we investigate the influence of the deposition geometry on the morphology and the magnetic anisotropy in thin Fe layers. We show that the uniaxial anisotropy for oblique-incidence deposition originates from long-ranged dipolar interactions.The film deposition, the structural and morphological characterizations were done in situ in an ultra high vacuum chamber equipped with Scanning Tunnelling Microscopy (STM), Low Energy Electron Diffraction (LEED) and X-rays Photoelectron Diffraction (XPD) facilities. The magnetic anisotropy has been measured ex situ with the recent Transversely Biased Initial Inverse Susceptibility and Torque (TBIIST) method described in details in the reference [7]. Prior to Fe deposition at room temperature, an ultra thin and atomically flat iron silicide layer with c(4x8) periodicity was grown on the Si(111) wafer [8]. This template layer prevents the diffusion of Si into the Fe layer and improves the epitaxy of the Fe

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Structure analysis of thin iron-silicide film from φ-scan RHEED Patterson function

et al. 2006

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The atomic structure of thin iron silicide film, grown epitaxially on the Si(111) surface, has been analyzed by means of the three-dimensional RHEED Patterson function analysis. The iron-silicide-terminated surface with (2 × 2) periodicity has been prepared by a solidphase epitaxy method. 2 ML of Fe were deposited on the Si(111)-(7 × 7) surface and annealed at 500 • C. Three-dimensional Patterson function was calculated from series of φ-scanned RHEED intensity distributions converted to the k-space. The resulting model of γ-FeSi2 structure consists of two silicide layers faulted to each other with three relaxed Si adatoms above the H3 site.PACS : 61.14.Hg, 68.55.-a

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p(1×1)toc(4×8)periodicity change in ultrathin iron silicide on
S. Hajjar
¹
,
G. Garreau
²
,
S. Pelletier
³

et al.

Cited by 22 publications

References 25 publications

Investigation of Magnetic Dead Layer on Iron Silicide Surfaces

Investigation of Magnetic Dead Layer on Iron Silicide Surfaces

Magnetic anisotropy versus morphology in Fe films deposited on ultrathin iron silicides

Structure analysis of thin iron-silicide film from φ-scan RHEED Patterson function

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p(1×1)toc(4×8)periodicity change in ultrathin iron silicide onS. Hajjar1, G. Garreau2, S. Pelletier3 et al.

Cited by 22 publications

References 25 publications

Investigation of Magnetic Dead Layer on Iron Silicide Surfaces

Investigation of Magnetic Dead Layer on Iron Silicide Surfaces

Magnetic anisotropy versus morphology in Fe films deposited on ultrathin iron silicides

Structure analysis of thin iron-silicide film from φ-scan RHEED Patterson function

Contact Info

Product

Resources

About

p(1×1)toc(4×8)periodicity change in ultrathin iron silicide on
S. Hajjar
¹
,
G. Garreau
²
,
S. Pelletier
³

et al.