1983
DOI: 10.1016/0038-1101(83)90174-0
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Minority carrier recombination in heavily-doped silicon

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Cited by 263 publications
(102 citation statements)
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“…Here we also compare surface recombination velocities, S, obtained on methyl and octylate terminated n-type silicon surface. [26] Values of S = 0.7 cm s -1 have been extracted in RN of propenyl and propynyl -SiNWs, i.e. around four and one half lower than that of RN-SiO2 (2.7 cm s -1 ) and methyl (1.3 cm s -1 ) -SiNWs, respectively.…”
Section: Resultsmentioning
confidence: 85%
See 1 more Smart Citation
“…Here we also compare surface recombination velocities, S, obtained on methyl and octylate terminated n-type silicon surface. [26] Values of S = 0.7 cm s -1 have been extracted in RN of propenyl and propynyl -SiNWs, i.e. around four and one half lower than that of RN-SiO2 (2.7 cm s -1 ) and methyl (1.3 cm s -1 ) -SiNWs, respectively.…”
Section: Resultsmentioning
confidence: 85%
“…The observed reduction of surface recombination velocity agrees with analogous effects seen on chlorinated/alkylated nSi surfaces. [26] In propenyl -SiNWs films a fast decay component (3.7 cm s -1 ) has been also observed. The reduction of the S values with respect to SiO2 RN-SiNWs indicates that molecule terminations partially passivate interface trap states, explaining this way the achievement of stability to oxidation.…”
Section: Resultsmentioning
confidence: 87%
“…Diffusion enlarges the size of the charge cloud and could cause spreading of charges across several adjacent elements. It is reasonable to assume that the recombination losses are negligible in this region due to large carrier lifetime (∼10 −3 s; Tyagi & van Overstraeten 1983). The general expression for the mean-square radius of charge cloud reaching the interface between the field and field-free zone is given by (Pavlov & Nousek 1999) …”
Section: Field-free Zone Interactionsmentioning
confidence: 99%
“…The following models were used in the simulations: Schottky contact [19], electron effective density [20], hole effective density [21], carrier lifetimes [22], [23], enhanced Lombardi model for surface scattering and temperature dependent mobility [24] and Philips unified mobility model [25] for carrier concentration dependent mobilities.…”
Section: Simulationmentioning
confidence: 99%