Millimeter-Wave Planar Antenna Array Based on Modified Bulk Silicon Micromachining Technology

Liu, Peiqin; Li, Yue; Wang, Shaodong; Zhang, Zhijun

doi:10.1109/tap.2020.2992898

Cited by 7 publications

(1 citation statement)

References 43 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Different micromachining methods employing siliconbased deep reactive ion etching (DRIE) [3,4], SU8 photoresist [5,6], or LIGA (Lithography, Electroplating, and Molding)-based thick layer electroplating [7,8] have been investigated and utilized for manufacturing of mmWave and sub-mmWave waveguide components. However, these methods suffer from several fabrication issues.…”

Section: Introductionmentioning

confidence: 99%

Micromachined Wideband Ridge Gap Waveguide Power Divider at 220–325 GHz

et al. 2022

View full text Add to dashboard Cite

A micromachined ridge gap waveguide power divider operating at 220-325 GHz is presented. The device is fabricated by SUEX dry film photoresist. Dry film photoresist can be used to obtain geometrical features with high accuracy using a robust fabrication process. The designed power divider has simple geometrical features and a wide band performance. The measured transmission coefficients are equal to -3.5 ± 0.4 dB at 220-325 GHz and the measured input reflection coefficient is below -12 dB at 220-325 GHz. The measurement results are in good agreement with simulations, demonstrating that the proposed fabrication method is suitable for the fabrication of waveguide components operating at the millimeter and sub-millimeter wave range. The presented low-loss ridge gap waveguide power divider may enable cost-effective and rapid fabrication of passive devices such as high gain antennas operating up to THz frequencies.INDEX TERMS Dry film photoresist, gap waveguide, micromachining, millimeter wave, power divider, sub-millimeter wave.

show abstract