1994
DOI: 10.1111/j.1151-2916.1994.tb05371.x
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Microstructure/Process Relations in Sol‐Gel‐Prepared KnbO3 Thin Films on (100) MgO

Abstract: Epitaxial (110) orthorhombic KNbO, thin films were prepared using alkoxide solutions. Single-phase films were produced with stoichiometric sols while slight variations in stoichiometry (52/48 Nb/K or 48/52 NWK) created residual second phases. Nucleation and growth of KNbO, as a function of process conditions were monitored by observing the KNbO, rosettes produced from niobium-rich solutions. Methanolic solutions produced films with the highest rosette density and the highest amount of KNbO,. Hydrolysis of the … Show more

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Cited by 25 publications
(9 citation statements)
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“…So far, KNbO 3 thin films can be synthesized by the following methods: metalorganic chemical vapor deposition (MOCVD), pulsed-laser deposition, , sputtering, , liquid-phase epitaxy, and sol−gel. All these synthesis routes share similar disadvantages of high-temperature processing, requiring temperatures ranging between 600 °C and over 900 °C to obtain a crystalline KNbO 3 phase. The high synthesis temperatures cause typical problems such as difficulties to control potassium stoichiometry due to high volatilization of potassium oxide, interdiffusion between film and the substrate, ,, formation of interphase layers (particularly in the case of using MgO substrate), , and multidomain formation during cooling to room temperature. , ,,, The presence of pyrochlore and/or amorphous phases, as well as porosity, was reported particularly for the KNbO 3 films synthesized by the sol−gel method. , In addition, liquid-phase epitaxy (LPE) is not well suited for films with thickness under 1 μm …”
Section: Introductionmentioning
confidence: 99%
“…So far, KNbO 3 thin films can be synthesized by the following methods: metalorganic chemical vapor deposition (MOCVD), pulsed-laser deposition, , sputtering, , liquid-phase epitaxy, and sol−gel. All these synthesis routes share similar disadvantages of high-temperature processing, requiring temperatures ranging between 600 °C and over 900 °C to obtain a crystalline KNbO 3 phase. The high synthesis temperatures cause typical problems such as difficulties to control potassium stoichiometry due to high volatilization of potassium oxide, interdiffusion between film and the substrate, ,, formation of interphase layers (particularly in the case of using MgO substrate), , and multidomain formation during cooling to room temperature. , ,,, The presence of pyrochlore and/or amorphous phases, as well as porosity, was reported particularly for the KNbO 3 films synthesized by the sol−gel method. , In addition, liquid-phase epitaxy (LPE) is not well suited for films with thickness under 1 μm …”
Section: Introductionmentioning
confidence: 99%
“…Different macroscopic phases develop indicating an inadequate distribution of metal ions in the film. This aspect was observed before, 22 but interfering hydrolysis was not excluded. The unintended interaction with ambient humidity is therefore definitively ruled out as the primary explanation for the depicted results.…”
Section: Resultsmentioning
confidence: 73%
“…The lattice spacing along the growth and lateral direction are 0.397 and 0.409 nm, respectively, whereas the spacing in bulk KNO was reported to be 0.3984 and 0.4035 nm, respectively. 31 The average crystallite size in the nanofiber sample was around 20 ± 5 nm and estimated by direct measurement of the size distribution using enhanced microscopy images as shown in Figure S2.…”
Section: Methodsmentioning
confidence: 99%