2017
DOI: 10.1088/1361-6528/aa53c2
|View full text |Cite
|
Sign up to set email alerts
|

Microstructure and ferroelectricity of BaTiO3 thin films on Si for integrated photonics

Abstract: Significant progress has been made in integrating novel materials into silicon photonic structures in order to extend the functionality of photonic circuits. One of these promising optical materials is BaTiO or barium titanate (BTO) that exhibits a very large Pockels coefficient as required for high-speed light modulators. However, all previous demonstrations show a noticable reduction of the Pockels effect in BTO thin films deposited on silicon substrates compared to BTO bulk crystals. Here, we report on the … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

3
80
1

Year Published

2019
2019
2024
2024

Publication Types

Select...
6

Relationship

0
6

Authors

Journals

citations
Cited by 87 publications
(89 citation statements)
references
References 43 publications
(81 reference statements)
3
80
1
Order By: Relevance
“…This large deviation precludes confident simulation of the individual tensor components. However, the data are in qualitative agreement with the anticipated EO behavior of orthogonal, in‐plane oriented ferroelectric domains with P 4 mm symmetry . Near ϕE = 0° and 90°, where only a change in the birefringence of the film is induced, δ is minimal for the incident polarization angle (θi = 0° relative to BTO[100]).…”
Section: Resultssupporting
confidence: 73%
See 4 more Smart Citations
“…This large deviation precludes confident simulation of the individual tensor components. However, the data are in qualitative agreement with the anticipated EO behavior of orthogonal, in‐plane oriented ferroelectric domains with P 4 mm symmetry . Near ϕE = 0° and 90°, where only a change in the birefringence of the film is induced, δ is minimal for the incident polarization angle (θi = 0° relative to BTO[100]).…”
Section: Resultssupporting
confidence: 73%
“…An average reff of 27 ± 4 PM/V is determined for multiple different pads at the same applied field and ϕE = 45°. For reference, this value is comparable to oriented BTO films grown by pulsed laser deposition (37 pm/V), radio‐frequency sputtering (41 pm/V), CVD (7 PM/V), and atomic layer deposition (30 pm/V) . Bulk BTO and high quality thin films (typically grown by MBE) exhibit coefficients on the order of 100‐1000 pm/V .…”
Section: Resultsmentioning
confidence: 69%
See 3 more Smart Citations