Microstructure and electrical properties of sputter-deposited Zn0.87Fe2.13O4 thin layers

Capdeville, Stéphanie; Alphonse, Pierre; Bonningue, Corine; Presmanes, Lionel; Tailhades, Philippe

doi:10.1063/1.1808904

Cited by 25 publications

(18 citation statements)

References 12 publications

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“…This lower value of the magnetization in the case of thin film cobaltite cannot be explained by the presence of porosity. Indeed, it was shown that ferrite thin films deposited by RF sputtering from a ceramic target, at 0.5 Pa, are dense due to low shadowing effects during the film growth [42,43]. Most of the articles related to magnetic properties of oxide thin films obtained by sputtering further show that the samples obtained have much lower saturation magnetization than those measured on bulk materials [29,44,45].…”

Section: Magnetic Propertiesmentioning

confidence: 93%

“…In addition, the increase of thin films inter-granular porosity versus deposition pressure can also contribute to the increase in resistivity versus argon pressure. Indeed, F. Oudrhiri-Hassani et al [42] and S. Capdeville et al [43] have shown a strong increase of the inter-granular porosity for the highest deposition pressures. The surface enhancement factor (surface area divided by projected area) was about 20 to 55 times higher for the films deposited at 2.0 Pa than for those made at 0.5 Pa. Electrical measurements revealed a strong dependence of the resistivity versus the inter-grain porosity.…”

Section: Electrical Propertiesmentioning

confidence: 97%

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Preparation of iron cobaltite thin films by RF magnetron sputtering

et al. 2015

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International audienceIron cobaltite thin films with spinel structure have been elaborated by radio-frequency (RF) magnetronsputtering from a Co1.75Fe1.25O4 target. Influence of argon pressure on structure, microstructure and physicalproperties of films has been examined. Iron–cobalt oxide thin films essentially consist of one spinel phasewhen deposited at low pressure (0.5 and 1.0 Pa). At high pressure (2.0 Pa), the global stoichiometry of the filmis changed which results in the precipitation of a mixed monoxide of cobalt and iron beside the spinel phase.This in-situ reduction due to an oxygen loss occurring mainly at high deposition pressure has been revealed byX-ray diffraction and Raman spectroscopy. Microstructural evolution of thin film with argon pressure has beenshown by microscopic observations (AFM and SEM). The evolution of magnetic and electrical properties, versusargon pressure, has been also studied by SQUID and 4 point probe measurements

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Section: Magnetic Propertiesmentioning

confidence: 93%

Section: Electrical Propertiesmentioning

confidence: 97%

Preparation of iron cobaltite thin films by RF magnetron sputtering

et al. 2015

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“…During sputtering of an oxide target, the layer grown on the substrate is submitted to continuous bombardment with high energy species from plasma and target, which can induce specific characteristics or properties [1][2][3]. In this study, we tuned bias sputtering conditions to obtain nanocomposite iron oxide from a magnetite target.…”

Section: Introductionmentioning

confidence: 99%

Nanocomposite , thin films prepared by RF sputtering and revealed by magnetic coupling effects

Mauvernay

Presmanes

Bonningue

et al. 2008

Journal of Magnetism and Magnetic Materials

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Magnetic and semi-conducting nanocomposite iron oxide thin films have been prepared under bias polarization, by radio-frequency sputtering of a magnetite target. The nature of the phases obtained in the thin films depends on the bias power density. The increase in power density, from 0 to 110 mW=cm 2 , allows the preparation of magnetite, magnetite/wustite and wustite/a-iron nanocomposites successively. Magnetic measurements at low temperature show exchange bias for two-phases films even though the minor phase is not detected by grazing angle X-ray diffraction. The exchange bias can reach very high values of about 4300 Oe. Electrical properties at room temperature are interpreted taking into account both the modifications of the film compactness, and the nature of the phases from which they are made. r

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“…However the control of this chemical reaction is quite difficult. A convenient method to obtain substituted-ferrite thin films is by radio frequency (RF) sputtering of a mixed ferrite target [4][5][6]. Physical and chemical properties of as-such grown films are highly dependent on the sputtering conditions (argon pressure, RF power, target/substrate distance, magnetron…).…”

Section: Introductionmentioning

confidence: 99%

Elaboration and characterization of Fe1–xO thin films sputter deposited from magnetite target

et al. 2007

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Majority of the authors report elaboration of iron oxide thin films by reactive magnetron sputtering from an iron target with Ar-O 2 gas mixture. Instead of using the reactive sputtering of a metallic target we report here the preparation of Fe 1-x O thin films, directly sputtered from a magnetite target in a pure argon gas flow with a bias power applied. This oxide is generally obtained at very low partial oxygen pressure and high temperature. We showed that bias sputtering which can be controlled very easily can lead to reducing conditions during deposition of oxide thin film on simple glass substrates. The proportion of wustite was directly adjusted by modifying the power of the substrate polarization. Atomic force microscopy was used to observe these nanostructured layers. Mössbauer measurements and electrical properties versus bias polarization and annealing temperature are also reported.

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Microstructure and electrical properties of sputter-deposited Zn0.87Fe2.13O4 thin layers

Cited by 25 publications

References 12 publications

Preparation of iron cobaltite thin films by RF magnetron sputtering

Preparation of iron cobaltite thin films by RF magnetron sputtering

Nanocomposite , thin films prepared by RF sputtering and revealed by magnetic coupling effects

Elaboration and characterization of Fe1–xO thin films sputter deposited from magnetite target

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