Microstructural size effects on the hardness of nanocrystalline TiN/amorphous-SiNx coatings prepared by magnetron sputtering

Kauffmann, Florian; Dehm, Gerhard; Schier, V.; Schattke, A.; Beck, Thomas; Lang, Stéphane; Arzt, Eduard

doi:10.1016/j.tsf.2004.08.080

Cited by 41 publications

(21 citation statements)

References 24 publications

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“…Depending on deposition process and parameters, nano-crystalline TiN and Ti-Si-N coatings can also follow this morphology [68,69]. In previous studies of Ti-Cr-B-N coatings deposited by IIAMS on Si, similar texture and grain size to the present findings were reported, though no conclusive evidence of columnar growth was revealed [70,71].…”

Section: Ti-cr-b-n and Ti-al-si-b-n Coatingssupporting

confidence: 83%

Thermal Stability of Nanostructured Coatings

Fabrizi

Cabibbo

Cecchini

et al. 2010

MSF

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Abstract. This paper is a review of the thermal stability of nanostructured nitride coatings synthesised by reactive magnetron sputtering technique. In the last three decade, nitride based coatings have been widely applied as hard wear-protective coatings in mechanical components. More recently, a larger interest has been addressed to evaluate the thermal stability of such coatings, as their mechanical and tribological properties are deteriorated at high working temperatures.This study describes the microstructural, mechanical and compositional stability of nanocrystalline Cr-N and nano-composited Ti-N based coatings (Ti-Al-Si-B-N and Ti-Cr-B-N) after air and vacuum annealing. For Cr-N coatings annealing in vacuum induces phase transformation from CrN to Cr 2 N, while after annealing in air only Cr 2 O 3 phase is present. For Ti-N based coatings, a well-definite multilayered structure was shown after air annealing. Degradation of mechanical properties was observed for all the nitride coatings after thermal annealing in air.

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Section: Ti-cr-b-n and Ti-al-si-b-n Coatingssupporting

confidence: 83%

Thermal Stability of Nanostructured Coatings

Fabrizi

Cabibbo

Cecchini

et al. 2010

MSF

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“…Этого можно достичь в случае, если твёрдая плёнка будет аморфной. Это требование легко выполни-мо, если использовать новое семейство композитов Si 3 N 4 MeN x с высо-ким содержанием (50 об.%) фазы a-Si 3 N 4 [14][15][16][17]. Такие покрытия аморфны и их твёрдость достигает от 20 до 40 ГПа, т.е.…”

Section: физические свойства и стойкость к высокотемпературному оксидunclassified

“…Все это свидетельствует о высокой плотности дефектов кристаллического строения и высоких локальных внутренних на-пряжениях в исследуемых покрытиях. Оценка по найденным зна-чениям X ij избыточной плотности дислокаций одного знака [17,18] дает значения  =10 11 см…”

Section: покрытия Tin «N-tin-медь»unclassified

Structure, Properties and Fabrication of the Solid Nanocrystalline Coatings Deposited in Several Ways

Beresnev¹,

Pogrebnyak

Azarenkov

et al. 2007

Usp. Fiz. Met.

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“…These materials have low mechanical and tribological properties; 2) the Si homogeneous solubility in the TiN FCC lattice to form the stoichiometric compound T i 1 − x Si x N y , with low content of silicon. This material has good tribological properties, but with high Si content it becomes unstable; 3) T iN nano-crystal structures in an amorphous Si 3 N 4 matrix, with excellent properties and 4) a complete amorphous compound formed by an increase in crystal defects or decrease of the crystallite size below X ray diffraction detection limit, with high Si content [15], [16]. Theoretic studies about compound stability and behavior will give a full understanding on the formation of different coexisting phases in order to find the ideal deposition parameters for needed applications.…”

Section: Introductionmentioning

confidence: 99%

Influence of Si Atoms Insertion on the Formation of the Ti-Si-N Composite by DFT Simulation

González¹,

Restrepo

Portilla³

et al. 2016

ing.cienc.

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Using Density Functional Theory (DFT) SiN and T iN structures were simulated, in order to study the influence of the silicon atoms insertion in the T iN lattice placed on interstitial and substitutional positions in a face centered cubic (FCC) crystalline lattice. Results showed that the SiN − F CC structure is pseudo-stable; meanwhile the tetragonal structure is stable with ceramic behavior. The T iN − F CC structure is stable with ceramic behavior similar to SiN − T etragonal. 21% silicon atoms insertion in interstitial positions showed high induced deformation, high polarization and Si − N bond formation, indication an amorphous transition that could lead to the production of a material composed from T iN grains or nano-grains embedded in a Si − N amorphous matrix. When 11|Influence of Si Atoms Insertion on the Formation of the Ti-Si-N Composite by DFT Simulation including 21% of silicon atoms, substituting titanium atoms, the distribution showed higher stability that could lead to the formation of different phases of the stoichiometric T i1 −x SixNy compound. Key words: density functional theory; crystalline structure; nano-composite; silicon; thin films; coatings.Influencia de la inserción de átomos de Si en la formación del compuesto Ti-Si-N por simulación DFT ResumenSe simularon estructuras del SiN y TiN utilizando Teoría de Funcionales de Densidad (DFT), con el fin de estudiar la influencia de la inserción de átomos de Si en la estructura del TiN en posiciones intersticiales y sustitucionales de una red cristalina cúbica centrada en las caras (FCC). Los resultados mostraron que la estructura SiN-FCC es pseudo estable, mientras que la estructura tetragonal es estable, con comportamiento cerámico. La estructura del TiN-FCC es estable con un comportamiento cerámico similar al del SiN-tetragonal. La inserción de 21 % de átomos de Si en posiciones intersticiales, el material mostró alta deformación inducida, alta polarización y formación de enlaces Si-N, indicadores de una transición amorfa que podría producir un compuesto formado por granos o nanogranos de TiN embebidos en una matriz amorfa de Si-N. Mientras que al incluir 21 % de Si sustituyendo átomos de Titanio, se observó una distribución más estable, que puede producir diferentes fases del compuesto estequiométrico Ti1-xSixNy.Palabras clave: teoría de funcionales de densidad; estructura cristalina; silicio; películas delgadas; recubrimiento.

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Microstructural size effects on the hardness of nanocrystalline TiN/amorphous-SiNx coatings prepared by magnetron sputtering

Cited by 41 publications

References 24 publications

Thermal Stability of Nanostructured Coatings

Thermal Stability of Nanostructured Coatings

Structure, Properties and Fabrication of the Solid Nanocrystalline Coatings Deposited in Several Ways

Influence of Si Atoms Insertion on the Formation of the Ti-Si-N Composite by DFT Simulation

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