Microstructural characteristics and mechanical properties of magnetron sputtered nanocrystalline TiN films on glass substrate

Abstract

Nanocrystalline TiN thin films were deposited on glass substrate by d.c. magnetron sputtering. The microstructural characteristics of the thin films were characterized by XRD, FE-SEM and AFM. XRD analysis of the thin films, with increasing thickness, showed the (200) preferred orientation up to 1⋅26 μm thickness and then it transformed into (220) and (200) peaks with further increase in thickness up to 2⋅83 μm. The variation in preferred orientation was due to the competition between surface energy and strain energy during film growth. The deposited films were found to be very dense nanocrystalline film with less porosity as evident from their FE-SEM and AFM images. The surface roughness of the TiN films has increased slightly with the film thickness as observed from its AFM images. The mechanical properties of TiN films such as hardness and modulus of elasticity (E) were investigated by nanoindentation technique. The hardness of TiN thin film was found to be thickness dependent. The highest hardness value (24 GPa) was observed for the TiN thin films with less positive micro strain.

Ceramics and ceramic coatings in orthopaedics

“…Examples of the surface texture and crosssection of two different TiN coatings are shown in Fig. 2(a) and (b), respectively [226,227], and a graphic example of coating defects is shown in Fig. 2(c) from the work of Kamiya et al [228] .…”

Влияние температуры отжига на микроструктуру и морфологию пленок TiN, синтезированных методом дуального магнетронного распыления

“…В результате за счет отжига происходит перегруппировка атомов путем диффузии в пленке и тем самым отжиг улуч-шает степень кристалличности образцов [8,9]. Как уже говорилось в работе [10], в области низких температур тепловая энергия является благоприятной для роста (111) плоскостей, в результате (111) плоскость растет гораздо быстрее, чем (200) плоскость.…”

High temperature oxidation behavior of nanostructured Ni–Al coatings on superalloy

“…where Br is the FWHM of a measured Bragg peak, B strain = ε tan is the peak broadening from the residual strain ε measured by XRD using the cos 2˛s in 2 method, and C is the instrumental line broadening [15,16]. The surface topographical characterizations of the Ni-Al coatings were made by using FE-SEM (FEI, Quanta 200F) at an acceleration voltage of 20 KV and AFM (NT-MDT, Ntegra) analysis operated in a semicontact (tapping) mode.…”