Microstructural and electrochemical properties of lithium manganese oxide thin films grown by pulsed laser deposition

Singh, Deepika; Kim, W.-S; Crăciun, V.; Hofmann, Heinrich; Singh, Rajiv K.

doi:10.1016/s0169-4332(02)00328-8

Cited by 40 publications

(25 citation statements)

References 11 publications

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“…It is noticed that these distances are lower for films grown at lower substrate temperatures because of the formation of defective spinel structure in which the cubic cell lies under more compressional stresses [18]. Further investigations are in progress to study the influence of substrate temperature on stress-related parameters.…”

Section: Xrd Studiesmentioning

confidence: 99%

Structural and electrical properties of lithium manganese oxide thin films grown by pulsed laser deposition

Hussain

Krishna

Vani

et al. 2007

Ionics

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LiMn 2 O 4 thin films were deposited by reactive pulsed laser deposition technique and studied the microstructural and electrical properties of the films. The LiMn 2 O 4 thin films deposited in an oxygen partial pressure of 100 mTorr and at a substrate temperature of 573 K from a lithium rich target were found to be nearly stoichiometric. The films exhibited predominantly (111) orientation representing the cubic spinel structure with Fd3m symmetry. The intensity of (111) peak increased and a slight shift in the peak position was observed with the increase of substrate temperature. The lattice parameter increased from 8.117 to 8.2417 Å with the increase of substrate temperature from 573 to 873 K. The electrical conductivity of the films is observed to be a strong function of temperature. The evaluated activation energy for the films deposited at 873 K is 0.64 eV.

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Section: Xrd Studiesmentioning

confidence: 99%

Structural and electrical properties of lithium manganese oxide thin films grown by pulsed laser deposition

Hussain

Krishna

Vani

et al. 2007

Ionics

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“…The peak current of T-LMO is bigger than that of the others. For a reversible system, according to the literature reported by Singh et al [15], the peak current is defined by the Randle-Sevick equation shown below:…”

Section: Resultsmentioning

confidence: 99%

Preparation of TiO2-coated LiMn2O4 by carrier transfer method

Lai

Liu

2008

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The TiO 2 -coated LiMn 2 O 4 has been prepared by a carrier transfer method and investigated. This novel synthetic method involved the transfer of TiO 2 into the surface of LiMn 2 O 4 with Vulcan XC-72 active carbon powders as a dispersant. The X-ray diffraction shows that spinel structure of materials does not change after the coating of TiO 2 . The electrochemical performance tests show that the initial discharge capacity of TiO 2 -modified LiMn 2 O 4 is 111.5 mA h g −1 , which is better than that of pristine LiMn 2 O 4 (103.8 mA h g −1 ). The cyclic performance is significantly improved after surface modification. The TiO 2 -modified LiMn 2 O 4 by a carrier transfer method exhibits better discharge capability and lower resistance.

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“…6. Hee-Soo Moon et al deposited LiMn 2 O 4 thin films on stainless steel substrates using rf-magnetron sputtering and reported a discharge capacity of 24 lAh cm -2 lm -1 (Moon and Park 2002) and Singh et al (2002) deposited LiMn 2 O 4 thin films using PLD and reported a Fig. 3 The variation of Mn-O and Mn-Mn distances with substrate temperature discharge capacity of about 115 mAh/g for the first cycle.…”

Section: Electrochemical Propertiesmentioning

confidence: 99%

Microstructural and electrochemical properties of rf-sputtered LiMn2O4 thin film cathodes

2012

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Lithium transition metal oxides have received considerable attention in recent years as high voltage positive electrode materials in the fabrication of all solid state microbatteries. Among various lithium-based cathode materials, LiMn 2 O 4 is one of the most promising cathode materials as it offers high energy density, high cell voltage, low cost, and low toxicity over the other electrode materials. Thin films of LiMn 2 O 4 were prepared by radio frequency magnetron sputtering on gold-coated silicon substrates under various substrate temperatures ranging from 373 to 673 K in a partial pressure of 3 9 10 -3 mbar with rf power 100 Watts. In the present investigation, the influence of substrate temperature on the growth and microstructural properties was studied. The films deposited at a substrate temperature less than 473 K was found to be X-ray amorphous. The initial crystallization has been observed at a substrate temperature of 523 K. The X-ray diffraction patterns of the films deposited in the substrate temperature range 523-673 K exhibited predominant (111) orientation representing cubic spinel structure with Fd3m symmetry. The grain size was found to be increased with the increase of substrate temperature as evidenced from SEM studies. However, additional impurity phases like Mn 3 O 4 were observed for the films deposited at higher substrate temperatures ([673 K) because of re-evaporation of Li ? ions in the films. The electrochemical (EC) studies were carried for the films deposited at T s = 673 K in aqueous media in the potential window of 0.0-1.2 V exhibited better electrochemical performance suggesting that the films are well suited as binder free thin film cathode material for commercially viable Li-ion secondary batteries.

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Microstructural and electrochemical properties of lithium manganese oxide thin films grown by pulsed laser deposition

Cited by 40 publications

References 11 publications

Structural and electrical properties of lithium manganese oxide thin films grown by pulsed laser deposition

Structural and electrical properties of lithium manganese oxide thin films grown by pulsed laser deposition

Preparation of TiO2-coated LiMn2O4 by carrier transfer method

Microstructural and electrochemical properties of rf-sputtered LiMn2O4 thin film cathodes

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