Abstract:Si capping layer is the most notable approach used in Ge metal-oxide-semiconductor (MOS);1-2 however, the Ge segregation and diffusion occurred during the growth of Si.3-4 The formation of undesirable GeOx is detrimental to the Ge nMOS reliability.5 This work focuses on using the scavenging process to reduce the segregated Ge atoms and to completely remove GeOx in the high-k/epi-Si/epi-Ge(001). We used high-resolution synchrotron radiation photoelectron spectroscopy (SRPES) to show the detailed development of … Show more
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