1999
DOI: 10.1007/s11664-999-0048-4
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Microscopic defects on MBE grown LWIR Hg1−xCdxTe material and their impact on device performance

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Cited by 46 publications
(27 citation statements)
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“…The dislocation densities always increase in the area near growth defects such as voids and void/ hillocks for II-VI materials. 16 In our case, the gaps between microcuboids and the epilayer are believed to play an important role. Because the gaps prevent the stem of microcuboids from coming into contact with the epilayer, the microcuboids will not introduce extra strain fields in the epilayer around them.…”
Section: Resultsmentioning
confidence: 65%
“…The dislocation densities always increase in the area near growth defects such as voids and void/ hillocks for II-VI materials. 16 In our case, the gaps between microcuboids and the epilayer are believed to play an important role. Because the gaps prevent the stem of microcuboids from coming into contact with the epilayer, the microcuboids will not introduce extra strain fields in the epilayer around them.…”
Section: Resultsmentioning
confidence: 65%
“…The model diode current can be written as (1) where d is the absorber layer thickness, N d is the base-layer donor concentration, τ p is the minority carrier lifetime, and n is an ideality factor. 11 Figure 5 shows a fit of Eq. 1 to the I-V characteristic of a small diameter (10-µm) diode from layer 3-971.…”
Section: Lwir Hgcdte On Cdte Buffer Layersmentioning
confidence: 99%
“…CdHgTe is an important material for infrared detectors 1,2 as the direct band gap can be compositionally tuned from -0.26 eV to 1.61 eV at 77 K. 3 Defects in CdHgTe can be detrimental to detector performance, 4,5 and it is therefore important to optimize the growth conditions to reduce their density. To this end we have performed a study of defects in the CdHgTe material system to determine how the different defects relate to the growth conditions.…”
Section: Introductionmentioning
confidence: 99%