Micromechanical testing of SU‐8 cantilevers

Hopcroft, Matthew A.; Kramer, Tobias; Kim, Gyu Man; Takashima, Kazuki; Higo, Yakichi; Moore, David F.; Brugger, Juergen

doi:10.1111/j.1460-2695.2005.00873.x

Cited by 98 publications

(77 citation statements)

References 11 publications

(28 reference statements)

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Although these technologies offer high precision, their fabrication methods are often complex, time consuming, and sometimes costly, which boosted research into alternative materials [2]. Nowadays, polymers have emerged as preferential material for microstructures fabrication due to their low-cost and easy processing [1][2][3]. In particular, epoxy-based negative photoresist (SU-8) is used as a structural and mold material.…”

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Optimized SU-8 Processing for Low-Cost Microstructures Fabrication without Cleanroom Facilities

et al. 2014

View full text Add to dashboard Cite

Abstract:The study and optimization of epoxy-based negative photoresist (SU-8) microstructures through a low-cost process and without the need for cleanroom facility is presented in this paper. It is demonstrated that the Ultraviolet Rays (UV) exposure equipment, commonly used in the Printed Circuit Board (PCB) industry, can replace the more expensive and less available equipment, as the Mask Aligner that has been used in the last 15 years for SU-8 patterning. Moreover, high transparency masks, printed in a photomask, are used, instead of expensive chromium masks. The fabrication of well-defined SU-8 microstructures with aspect ratios more than 20 is successfully demonstrated with those facilities. The viability of using the gray-scale technology in the photomasks for the fabrication of 3D microstructures is also reported. Moreover, SU-8 microstructures for different applications are shown throughout the paper.

show abstract

Section: Introductionmentioning

confidence: 99%

“…The field of Microtechnology and Micro-Electro-Mechanical Systems (MEMS) has grown rapidly in the last few years [1]. The beginning of microtechnology relies, mainly, in micromachining from OPEN ACCESS glass or silicon.…”

Section: Introductionmentioning

confidence: 99%

Optimized SU-8 Processing for Low-Cost Microstructures Fabrication without Cleanroom Facilities

et al. 2014

View full text Add to dashboard Cite

show abstract

“…The advantage of this polymer is the possibility of combined fabrication of both mechanical structures such as cantilevers and microfluidic channels [4]. The Young's modulus of SU-8 is about 50 times lower compared to traditional Si-based materials [5]. This results in a highly flexible lid if the thickness of the polymer is in the micrometer range.…”

Section: A Design Of Autonomous Valvementioning

confidence: 99%

Autonomous valve for detection of biopolymer degradation

et al. 2009

View full text Add to dashboard Cite

“…We performed micromechanical measurements with a beam bending based technique 31, 32 on stiffer (specifically designed) test cantilevers (T1 design, see Table I) using a commercial AFM (Bruker Dimension 3100). The use of a profilometer 33 is not possible for our cantilevers, due to their shape and their reduced dimensions of the cantilevers. From these measurements, it is easy to calculate the spring constants of the test cantilevers.…”

Section: A Mechanical Propertiesmentioning

confidence: 99%

Fast on-wafer electrical, mechanical, and electromechanical characterization of piezoresistive cantilever force sensors

Tosolini

Villanueva

Pérez‐Murano

et al. 2012

Review of Scientific Instruments

View full text Add to dashboard Cite

Validation of a technological process requires an intensive characterization of the performance of the resulting devices, circuits, or systems. The technology for the fabrication of micro and nanoelectromechanical systems (MEMS and NEMS) is evolving rapidly, with new kind of device concepts for applications like sensing or harvesting are being proposed and demonstrated. However, the characterization tools and methods for these new devices are still not fully developed. Here, we present an on-wafer, highly precise, and rapid characterization method to measure the mechanical, electrical, and electromechanical properties of piezoresistive cantilevers. The setup is based on a combination of probe-card and atomic force microscopy technology, it allows accessing many devices across a wafer and it can be applied to a broad range of MEMS and NEMS. Using this setup we have characterized the performance of multiple submicron thick piezoresistive cantilever force sensors. For the best design we have obtained a force sensitivity ℜF = 158μV/nN, a noise of 5.8 μV (1 Hz–1 kHz) and a minimum detectable force of 37 pN with a relative standard deviation of σr ≈ 8%. This small value of σr, together with a high fabrication yield >95%, validates our fabrication technology. These devices are intended to be used as bio-molecular detectors for the measurement of intermolecular forces between ligand and receptor molecule pairs.

show abstract

Micromechanical testing of SU‐8 cantilevers

Cited by 98 publications

References 11 publications

Optimized SU-8 Processing for Low-Cost Microstructures Fabrication without Cleanroom Facilities

Optimized SU-8 Processing for Low-Cost Microstructures Fabrication without Cleanroom Facilities

Autonomous valve for detection of biopolymer degradation

Fast on-wafer electrical, mechanical, and electromechanical characterization of piezoresistive cantilever force sensors

Contact Info

Product

Resources

About