2012
DOI: 10.1143/jjap.51.087001
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Microfabrication of Si and GaAs by Plasma Etching Process Using Bacterial Cells as an Etching Mask Material

Abstract: We demonstrated that bacterial cells can be used as a mask material for microfabrication of GaAs and Si by a Cl2 inductively coupled plasma (ICP) etching process. The etching rate of Escherichia coli cells was similar to that of electron beam resist or nanoimprint resist. We also demonstrated the degradation of bacterial cells by low-pressure plasma treatment using O2, Ar, air, and H2O for removal of bacterial cells as the etching mask material. Bacterial cells were efficiently degraded by ions in the low-pres… Show more

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Cited by 6 publications
(5 citation statements)
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“…Raman spectroscopy is generally used to characterize graphene and graphene layers. [26][27][28][29] Prior to the experiment of the ''face-down'' process, we confirmed the characteristics of graphene processed by Ar/F 2 plasma in a conventional setup (''face-up'') with Raman spectroscopy. Figure 2(a) shows Raman spectra of ''face-up'' monolayer graphene processed by Ar/F 2 plasma.…”
supporting
confidence: 53%
“…Raman spectroscopy is generally used to characterize graphene and graphene layers. [26][27][28][29] Prior to the experiment of the ''face-down'' process, we confirmed the characteristics of graphene processed by Ar/F 2 plasma in a conventional setup (''face-up'') with Raman spectroscopy. Figure 2(a) shows Raman spectra of ''face-up'' monolayer graphene processed by Ar/F 2 plasma.…”
supporting
confidence: 53%
“…To realize single-cell isolation, we have developed a microenclosure with a micropillar array structure and succeeded in the single-cell isolation and size separation of Escherichia coli and yeast cells. (1,2) On the other hand, single-cell manipulation is also regarded as an important elemental technique in cell analysis. Optical tweezers using laser light are widely employed for the manipulation of microbial cells.…”
Section: Introductionmentioning
confidence: 99%
“…We demonstrated, in the previous work, that this microenclosure can be used to measure the size change of Escherichia coli cells using oxygen plasma at each individual cell. (2) However, this microenclosure was fabricated on semiconductor wafers such as GaAs and InP by semiconductor processing technologies such as electron beam (EB) lithography and dry etching. A simpler fabrication process for microenclosure array structures is needed for the application of microenclosures to the field of microbial analysis.…”
Section: Introductionmentioning
confidence: 99%