Microcrystalline silicon carbide — New useful material for improvement of solar cell performance

Ma, Wen; Lim, C.C.; Saida, Takahiro; Okamoto, H.; Hamakawa, Yoshihiro

doi:10.1016/0927-0248(94)90066-3

Solar Energy Materials and Solar Cells

1994

DOI: 10.1016/0927-0248(94)90066-3

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Microcrystalline silicon carbide — New useful material for improvement of solar cell performance

Wen Ma

C.C. Lim

Takahiro Saida

et al.

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Cited by 8 publications

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Influence of total gas partial pressure on the structural formation of SiC thin films deposited by HWCVD technique

Tehrani

2016

J Mater Sci: Mater Electron

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Microcrystalline silicon carbide — New useful material for improvement of solar cell performance

Cited by 8 publications

References 2 publications

Influence of total gas partial pressure on the structural formation of SiC thin films deposited by HWCVD technique

Influence of total gas partial pressure on the structural formation of SiC thin films deposited by HWCVD technique

Structural and optical properties of four-hexagonal polytype nanocrystalline silicon carbide films deposited by plasma enhanced chemical vapor deposition technique

Structural analysis of nanocrystalline SiC thin films grown on silicon by ECR plasma CVD

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