Micro-grooving into thick CVD diamond films via hollow-cathode oxygen plasma etching

Yunata, Ersyzario Edo; Aizawa, Tatsuhiko

doi:10.1016/j.mfglet.2016.05.001

Cited by 9 publications

(3 citation statements)

References 12 publications

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“…In particular, higher etching rate of diamond coatings than the conventional etching methods with use of CF 4 is preferable for practical applications. As had reported in reference [15], no residuals of diamond films are analyzed to be present by the Raman spectroscopy. Sharp edge formation as well as no residual formation of diamonds by the present etching must be key-technological items in fabrication of diamond bio-MEMS and NEMS.…”

Section: Discussionmentioning

confidence: 93%

“…Since CF 4 is a typical hazard gas to be post-treated in the closed system to avoid from direct emission in air. The authors have been developing the high density oxygen plasma etching and ashing method for DLC-and diamond-coated tools and dies [11][12][13][14][15]. Since only a pure oxygen gas is used in practice, every etching process can be done in open to air.…”

Section: Introductionmentioning

confidence: 99%

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Micro-texturing into DLC/diamond coated molds and dies via high density oxygen plasma etching

Yunata

Aizawa

2015

Manufacturing Rev.

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-Diamond-Like Carbon (DLC) and Chemical Vapor Deposition (CVD)-diamond films have been widely utilized not only as a hard protective coating for molds and dies but also as a functional substrate for bio-MEMS/ NEMS. Micro-texturing into these hard coated molds and dies provides a productive tool to duplicate the original mother micro-patterns onto various work materials and to construct any tailored micro-textures for sensors and actuators. In the present paper, the high density oxygen plasma etching method is utilized to make micro-line and microgroove patterns onto the DLC and diamond coatings. Our developing oxygen plasma etching system is introduced together with characterization on the plasma state during etching. In this quantitative plasma diagnosis, both the population of activated species and the electron and ion densities are identified through the emissive light spectroscopy and the Langmuir probe method. In addition, the on-line monitoring of the plasmas helps to describe the etching process. DLC coated WC (Co) specimen is first employed to describe the etching mechanism by the present method. Chemical Vapor Deposition (CVD) diamond coated WC (Co) is also employed to demonstrate the reliable capacity of the present high density oxygen plasma etching. This oxygen plasma etching performance is discussed by comparison of the etching rates.

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Section: Discussionmentioning

confidence: 93%

Section: Introductionmentioning

confidence: 99%

Micro-texturing into DLC/diamond coated molds and dies via high density oxygen plasma etching

Yunata

Aizawa

2015

Manufacturing Rev.

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“…Further development resulted in hollow cathode utilization with greatly increased plasma density and high erosion rates. [17][18][19] However, implementation of the hollow cathode places some limitations on the batch size and uniformity, due to the localized plasma hot spot, moreover increased plasma density results in increased substrate temperature that might result in deterioration of the substrate materials, especially the HSS. Another downside of the oxygen ashing method is its inefficiency in the case of metal-based ceramic films.…”

Section: Introductionmentioning

confidence: 99%

Geometrical aspects of ion beam and plasma-based stripping processes for refurbishing cutting tools

Remnev

Uemura

2018

Jpn. J. Appl. Phys.

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Stripping of hard coatings is an essential technological step in the refurbishment of various cutting tools, such as carbide drills, endmills, routers, etc. The dry ion etching method of coating stripping may give significant advantages over conventional wet chemical etching. In this work, a novel ion plasma and ion beam-based method of film stripping are discussed in terms of etching uniformity. Thin film etching rate distribution is experimentally studied over the transverse cross-section of TiN and TiAlCrN coated drill bits. Furthermore the results are discussed in terms of simplified mathematical models of the film removal by ion sputtering. Advantages of the directional ion beam method over the field driven plasma immersion method are concluded.

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A comprehensive review of tool surface texturing in the cutting process

Zhou

Zhou²,

Yuan³

et al. 2022

Int J Adv Manuf Technol

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Micro-grooving into thick CVD diamond films via hollow-cathode oxygen plasma etching

Cited by 9 publications

References 12 publications

Micro-texturing into DLC/diamond coated molds and dies via high density oxygen plasma etching

Micro-texturing into DLC/diamond coated molds and dies via high density oxygen plasma etching

Geometrical aspects of ion beam and plasma-based stripping processes for refurbishing cutting tools

A comprehensive review of tool surface texturing in the cutting process

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