2021
DOI: 10.1063/5.0046554
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MgGa2O4 as alternative barrier for perpendicular MRAM junctions and VCMA

Abstract: The CoFeB/MgO/CoFeB magnetic tunnel junction (MTJ) is the central element of any high performance perpendicular Magnetoresistive Random Access Memory (MRAM) device. The MgO tunnel barrier, in contact with CoFeB films at both sides in the magnetic tunnel junction, provides a high tunnel magneto resistance (TMR) and perpendicular magnetic anisotropy (PMA) thanks to the high crystalline quality of the MgO/CoFeB interface achieved upon post-deposition annealing. We study MgGa2O4 as an alternative barrier material … Show more

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Cited by 5 publications
(4 citation statements)
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“…1,23 Exploring large PMA magnetic heterostructures with large VCMA effect is one of the main goals in the development of this new MRAM device. [24][25][26][27][28][29][30][31] The VCMA effect can be evaluated by the VCMA coefficient. In the linear regime, the correlation between VCMA and electric field can be represented by an equation, 15,23,24 VCMA = bE I = bE ext /e > , where b is the VCMA coefficient, E ext is the external electric field, E I is the electric field inside the insulator, and e > is the out-of-plane dielectric constant of the insulator.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…1,23 Exploring large PMA magnetic heterostructures with large VCMA effect is one of the main goals in the development of this new MRAM device. [24][25][26][27][28][29][30][31] The VCMA effect can be evaluated by the VCMA coefficient. In the linear regime, the correlation between VCMA and electric field can be represented by an equation, 15,23,24 VCMA = bE I = bE ext /e > , where b is the VCMA coefficient, E ext is the external electric field, E I is the electric field inside the insulator, and e > is the out-of-plane dielectric constant of the insulator.…”
Section: Introductionmentioning
confidence: 99%
“…1,23 Exploring large PMA magnetic heterostructures with large VCMA effect is one of the main goals in the development of this new MRAM device. 24–31…”
Section: Introductionmentioning
confidence: 99%
“…[14][15][16] Moreover, spinel oxides, such as MgAl 2 O 4 and MgGa 2 O 4 , can further improve the performance of MTJs when used as a tunnel barrier due to their small lattice mismatch with typical FM electrodes. [17,18] NiFe 2 O 4 (NFO) is a typical ferromagnetic spinel oxide with high magnetic ordering temperature and high saturation susceptibility. It is a very attractive candidate material for spintronic devices.…”
Section: Introductionmentioning
confidence: 99%
“…Iron and iron-based alloys are the most important materials used in magnetic devices, such as magnetic tunnel junction 26 28 , magnetic random access memory 29 , 30 and magnetic sensors 31 33 . Because of their different lattice structures, Fe/Ir interfaces function as a platform for controlling pseudomorphic growth, nanostructure evolution, and the formation of strained clusters.…”
Section: Introductionmentioning
confidence: 99%