2022
DOI: 10.3390/coatings12050668
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MG-63 and FetMSC Cell Response on Atomic Layer Deposited TiO2 Nanolayers Prepared Using Titanium Tetrachloride and Tetraisopropoxide

Abstract: Titanium oxide nanocoatings were synthesized on the surface of monocrystalline silicon and ultra-fine-grained titanium by atomic layer deposition (ALD) using titanium tetrachloride (TiCl4) and titanium tetraisopropoxide (TTIP). The morphology of the samples was studied by scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The structure and composition were studied by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), contact angle measurements, and energy-dispersive sp… Show more

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Cited by 2 publications
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“…The deposition of titanium oxide was carried out by the ALD according to a well-known technique [ 26 ], which also was described earlier in this paper [ 27 ]. Titanium chloride (IV) and water were used as precursors at 200 °C and 400 ALD cycles.…”
Section: Resultsmentioning
confidence: 99%
“…The deposition of titanium oxide was carried out by the ALD according to a well-known technique [ 26 ], which also was described earlier in this paper [ 27 ]. Titanium chloride (IV) and water were used as precursors at 200 °C and 400 ALD cycles.…”
Section: Resultsmentioning
confidence: 99%