Metrological Scanning Probe Microscopes ‐ Instruments for Dimensional Nanometrology

Danzebrink, Hans‐Ulrich; Pohlenz, Frank; Dai, Gaoliang; Savio, Claudio Dal

doi:10.1002/3527606661.ch1

Cited by 4 publications

(3 citation statements)

References 19 publications

(27 reference statements)

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“…Traceability to a realization of the definition of the SI metre is established through certification of the dimensions of an artefact's calibration structure. This certification is typically provided by a national measurement institute through a metrological scanning probe microscope with laser interferometry referenced to a realization of the SI metre [6], typically with an optical frequency comb [7].…”

Section: Spm Calibrationmentioning

confidence: 99%

Step height measurement of monoatomic silicon crystal lattice steps with a commercial atomic force microscope

Lawn,

Bolton,

Murphy

et al. 2024

Meas. Sci. Technol.

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Precise control of advanced materials relies on accurate dimensional metrology at the sub-nanometre scale. At this scale, the accuracy of scanning probe microscopy (SPM) has been limited by the lack of traceable transfer standard artefacts with calibration structures of suitable dimensions. With the adoption in 2019 of the silicon crystal lattice spacing as a secondary realization of the metre in the International System of Units (SI), SPM users have direct access to a realization of the SI metre at the sub-nanometre level by means of the step height of self-assembled monatomic lattice steps that can form on the surface of silicon crystals. A key challenge of successfully adopting this pathway is establishing the need for established protocols to minimize measurement errors and artifacts in routine laboratory use.In this study, step height measurements of monoatomic lattice steps in an ordinal/staircase structure on a Si(111) crystal surface have been derived from images acquired with a commercially available, research-level atomic force microscope (AFM). Measurement results derived from AFM images using three different SPM image processing and analysis software packages are compared. Significant sources of measurement uncertainty are identified; principally the contribution from the dependence on scan direction. The calibration of theAFM derived from this measurment was used to traceably measure the sub-nanometre lattice steps on a silicon carbide crystal surface to demonstrate the viability of this calibration pathway.

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Section: Spm Calibrationmentioning

confidence: 99%

Step height measurement of monoatomic silicon crystal lattice steps with a commercial atomic force microscope

Lawn,

Bolton,

Murphy

et al. 2024

Meas. Sci. Technol.

View full text Add to dashboard Cite

show abstract

“…Several laboratories and national metrology institutes (NMIs) have developed their own mAFMs, all these characterized by their on-board metrology systems and opto-mechanical set-ups [1][2][3][4][5][6][7][8][9][10]. These instruments make use of different arrangements and selected materials aiming at a good compromise between working volume, metrology loop, stiffness and overall thermal stability.…”

Section: Introductionmentioning

confidence: 99%

Recent advances of the metrological AFM at INRIM

Bellotti

Picotto

2014

Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VIII

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Traceable dimensional measurements of step-height and lateral standards, patterned surfaces, and particles at the nanoscale need of calibrated instruments such as the metrological AFMs. These instruments have onboard capacitive sensors or interferometers to control the relative tip-sample movements. Interferometers provide a direct traceability to the unit of length, at the cost of more complex set-ups. A new interferometer set-up has been developed to monitor tip-sample z-displacements of the instrument in use at INRIM. The interferometer is made of a compact and symmetric arrangement of the optics to fit available room and minimize the metrology loop. Preliminary results are reported together with the analysis of the main error sources of z-displacement measurements.

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“…The stylus method has been used for over 100 years in surface metrology [9], and due to the well understood interaction between the probe and the surface [10], it still serves as reference method for traceable surface measurements in different national metrology institutes [11][12][13]. Furthermore, atomic force microscopy (AFM, [14]) under tightly controlled environmental conditions and in ultrahigh vacuum enables a resolution down to the atomic scale [15,16], while metrological AFMs [17] ensure the traceability of the measurement results. Nevertheless, the measurement of soft surfaces by tactile methods is problematic due to the elastic or even plastic deformation of the workpiece caused by the applied probing force [18].…”

Section: Introduction and Literature Reviewmentioning

confidence: 99%

Effect of a Misidentified Centre of a Type ASG Material Measure on the Determined Topographic Spatial Resolution of an Optical Point Sensor

2022

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The article presents the determination of the topographic spatial resolution of an optical point sensor. It is quantified by the lateral period limit DLIM measured on a type ASG material measure, also called (topographic) Siemens star, with a confocal sensor following both a radial measurement and evaluation, as proposed by ISO 25178-70, and the measurement and subsequent evaluation of two line scans, proposed by the NPL Good Practice Guide. As will be shown, for the latter, an only slightly misidentified target centre of the Siemens star leads to quite significant errors of the determined DLIM. Remarkably, a misidentified target centre does not necessarily result in an overestimation of DLIM, but lower values might also be obtained. Therefore, a modified Good Practice Guide is proposed to determine DLIM more accurately, as it includes a thorough determination of the centre of the Siemens star as well. While the measurement and evaluation effort is increased slightly compared to the NPL Good Practice Guide, it is still much faster than a complete radial measurement and evaluation.

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Metrological Scanning Probe Microscopes ‐ Instruments for Dimensional Nanometrology

Abstract: Nanoscale Calibration Standards and Methods: Dimensional and Related Measurements in the Micro-and Nanometer Range.

Cited by 4 publications

References 19 publications

Step height measurement of monoatomic silicon crystal lattice steps with a commercial atomic force microscope

Step height measurement of monoatomic silicon crystal lattice steps with a commercial atomic force microscope

Recent advances of the metrological AFM at INRIM

Effect of a Misidentified Centre of a Type ASG Material Measure on the Determined Topographic Spatial Resolution of an Optical Point Sensor

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