Proceedings. The 16th International Conference on Microelectronics, 2004. ICM 2004.
DOI: 10.1109/icm.2004.1434261
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Methodology to compare on-state breakdown loci of GaAs FET's

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Cited by 4 publications
(5 citation statements)
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“…The impact-ionization-induced detrapping behavior was also confirmed by the appearance of bell-shaped features in the gate leakage current at V DS > 6 V, as the device is turned ON during transfer characterizations (Figure 1b). The impact ionization would induce electron-hole pairs with holes captured by the gate electrodes [22,23]. Meanwhile, the impact-ionization-induced detrapping behavior also causes a negative shift of V TH , as shown in Figure 1b.…”
Section: Device Fabricationmentioning
confidence: 97%
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“…The impact-ionization-induced detrapping behavior was also confirmed by the appearance of bell-shaped features in the gate leakage current at V DS > 6 V, as the device is turned ON during transfer characterizations (Figure 1b). The impact ionization would induce electron-hole pairs with holes captured by the gate electrodes [22,23]. Meanwhile, the impact-ionization-induced detrapping behavior also causes a negative shift of V TH , as shown in Figure 1b.…”
Section: Device Fabricationmentioning
confidence: 97%
“…At I G of −1 µA/mm, the monitored V DS increased rapidly with I D in the OFF-state as V GS was below V TH . The gate leakage current in this region was expected to be dominated by electrons injected from the gate into the channel through thermionic field emission and tunneling, and the increase of the V GS was driven by the increase of the drain current to turn on the channel gradually [23]. Once V GS increased above V TH and turned the device ON, lower drain bias voltage was enough to sustain the drain current, until an upsurge of I D featuring infinite conductance was observed.…”
Section: On-state Breakdown and Impact Ionizationmentioning
confidence: 99%
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“…3 The devices on-state breakdown loci 3.1 Correlation between on-state breakdown loci and I GS -V GS characteristics Figure 3 (b) presents the on-state breakdown loci of the PPHEMT, the PHEMT and the MESFET for an identical gate current condition: I GS =-1 mA/mm and measured using the gate-current extraction technique [5]. Three zones can be distinguished on the on-state breakdown loci depending on the conduction regime of the device [6,7]. Let us consider the BV-on state locus of a PHEMT in Fig.…”
Section: 2mentioning
confidence: 99%