Metasurface based on cross-shaped plasmonic nanoantennas as chemical sensor for surface-enhanced infrared absorption spectroscopy

Meo, Valentina Di; Caporale, Andrea; Crescitelli, A.; Janneh, Mohammed; Palange, E.; Marcellis, Andrea De; Portaccio, Marianna; Lepore, Maria; Rendina, Ivo; Ruvo, Menotti; Esposito, E.

doi:10.1016/j.snb.2019.02.014

Cited by 37 publications

(35 citation statements)

References 33 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Metal-dielectric metasurfaces find common use in optical sensing and communication applications since they allow to shape optical spectra, wave-fronts and polarizations [1][2][3][4][5][6] . They can also be used to increase the light-matter interaction for strong absorption/emission [7][8][9][10] or non-linear effects 4,[11][12][13] , to create beam splitters 14,15 , selective reflectors 16,17 , holograms [18][19][20] , polarizers [21][22][23] and for various other applications such as chiral photonic structures and chemical sensors [24][25][26] . Metal-insulator-metal (MIM) metasurfaces are of particular importance since they can be monolithically integrated with electronics in the same layer stack [27][28][29] and benefit from readily available high-yield large-scale production technologies, such as Complementary-Metal-Oxide-Semiconductor (CMOS), enabling low-cost optoelectronic devices 30,31 .…”

Section: Design Of Cmos-compatible Metal-insulator-metal Metasurfacesmentioning

confidence: 99%

Design of CMOS-compatible metal–insulator–metal metasurfaces via extended equivalent-circuit analysis

Dorodnyy

Koepfli

Lochbaum

et al. 2020

Sci Rep

View full text Add to dashboard Cite

Photonic metasurfaces compatible with large-scale production such as CMOS are of importance because they promise cointegration of electronics with photonics for detection, communication and sensing. The main challenges on the way of designing such metasurfaces are: (1) large variety of possible geometrical shapes of metasurface elements that makes finding the most appropriate shape difficult; (2) poor compatibility of available electronic layer stacks with photonics. In this paper we show how to address both of these challenges utilizing extended equivalent-circuit analysis. In a first step we classify the behavior of different metasurfaces using the equivalent circuit. We discover that metasurfaces that use inverted-dipole resonator type exhibit higher tolerance to dielectric spacer thickness, higher angular stability and have similar resonance quality-factor as other types. In the second step we utilize the equivalent-circuit scheme to efficiently optimize the parameters of inverted-dipole based metasurfaces for a layer stack such as given in a CMOS process. Finally, as an example we demonstrate how an inverted-cross structure can be adapted to a commercial 110 nm CMOS process with Al metal layers. We measured peak absorption above 90% at center wavelength around 4 µm with quality factor of approximately 5 and angular stability larger than 60°.

show abstract

Section: Design Of Cmos-compatible Metal-insulator-metal Metasurfacesmentioning

confidence: 99%

Design of CMOS-compatible metal–insulator–metal metasurfaces via extended equivalent-circuit analysis

Dorodnyy

Koepfli

Lochbaum

et al. 2020

Sci Rep

View full text Add to dashboard Cite

show abstract

“…In surface-enhanced IR absorption (SEIRA) spectroscopy ( Le et al, 2008 ; Adato et al, 2015 ; Neubrech et al, 2017 ), this is attained by means of artificial materials such as plasmonic metasurfaces, i.e., 2-D arrays of sub-wavelength metallic inclusions (nanoantennas) ( Chen et al, 2016 ). The functionalization of the metasurfaces is required to specifically capture the target analyte, while an accurate design of the nanoantennas is indispensable to support localized surface plasmon resonances with strong field enhancement ( Neubrech et al, 2008 ; Adato et al, 2011 ; Di Meo et al, 2019 ). The optimal sensing conditions for SEIRA occur when the resonance spectrum matches the vibrational signature of the target molecule, so that it is modulated by the absorption phenomenon, thereby allowing its recognition ( Adato et al, 2015 ; Neubrech et al, 2017 ).…”

Section: Introductionmentioning

confidence: 99%

“…The proposed device is a large-area (several mm 2 ) metasurface organized in “pixels,” consisting of different spatial regions engineered so as to work within separate IR spectral regions of interest (spanning from the fingerprint region to the region of the functional groups). Pixels are constituted by 2D arrays of cross-shaped gold nanoantennas, realized on a silicon substrate by means of electron beam lithography (EBL), which ensures a reproducible fabrication of homogeneous and robust devices ( Di Meo et al, 2019 ). The plasmonic response of each array (arising from both the collective and individual response of the nanoantennas) generates enhancement factors up to 10 6 .…”

Section: Introductionmentioning

confidence: 99%

Advanced DNA Detection via Multispectral Plasmonic Metasurfaces

Meo

Moccia

Sanità

et al. 2021

Front. Bioeng. Biotechnol.

Self Cite

View full text Add to dashboard Cite

We propose and demonstrate a sensing platform based on plasmonic metasurfaces for the detection of very low concentrations of deoxyribo-nucleic acid (DNA) fragments. The platform relies on surface-enhanced infrared absorption spectroscopy, implemented via a multispectral metasurface. Specifically, different regions (“pixels”) are engineered so as to separately cover the medium-infrared range of the electromagnetic spectrum extending from the functional-groups to the fingerprint region of a single analyte. In conjunction with a suitable bio-functionalization, this enables univocal and label-free recognition of specific molecules. For experimental validation, we fabricate a large-area gold metasurface on a silicon chip, and functionalize it with a recognition layer of peptide nucleic acid (PNA). Our experimental results indicate the possibility to detect complementary DNA fragments in concentrations as low as 50 fM, i.e., well below the value attained by standard methods, with additional advantages in terms of processing time, versatility and ease of implementation/operation.

show abstract

“…In contrast to the broadband absorbers, some studies aim to design narrowband absorbers that have an absorbance peak at single resonance wavelength. Many different nanopattern configurations were employed for achieving narrowband absorbers that are highly sensitive to the changes in the dielectric properties of their surroundings . Liu et al designed an MIM nanodisk narrowband perfect absorber with a sensitivity of 400 nm RIU −1 (refractive index unit) .…”

Section: Introductionmentioning

confidence: 99%

“…Lee et al designed 7 × 7 gold nanoslit arrays on a glass substrate that demonstrates a sensitivity of 668 nm RIU −1 . Di Meo et al designed polarization insensitive cross‐shaped plasmonic nanoantennas based a chemical sensor with a sensitivity of 600 nm RIU −1 . Yong et al theoretically proposed a unit cell with four very close cylindrical nanodisk metal–metal (MM) architectures that can operate as a refractive index sensor with a sensitivity of 885 nm RIU −1 .…”

Section: Introductionmentioning

confidence: 99%

Lithography‐Free Random Bismuth Nanostructures for Full Solar Spectrum Harvesting and Mid‐Infrared Sensing

Soydan

Ghobadi

Yıldırım

et al. 2019

Advanced Optical Materials

View full text Add to dashboard Cite

A lithography‐free, double‐functional single bismuth (Bi) metal nanostructure is designed, fabricated, and characterized for ultrabroadband absorption in the visible (vis) and near‐infrared (NIR) ranges, and for a narrowband response with ultrahigh refractive index sensitivity in the mid‐infrared (MIR) range. To achieve a large‐scale fabrication of the design in a lithography‐free route, the oblique‐angle deposition approach is used to obtain densely packed and randomly spaced/oriented Bi nanostructures. It is shown that this fabrication technique can provide a bottom‐up approach to controlling the length and spacing of the design. The characterization findings reveal a broadband absorbance above 0.8 in vis and NIR, and a narrowband absorbance centered around 6.54 µm. Dense architecture and extraordinary permittivity of Bi provide strong field confinement in ultrasmall gaps between nanostructures, and this can be utilized for a sensing application. An ultrahigh sensitivity of 2151 nm refractive‐index unit (RIU–1) is acquired, which is, as far as it is known, the experimentally highest sensitivity attained so far. The simple and large‐scale compatible fabrication route of the design together with the extraordinary optical response of Bi coating makes this design promising for many optoelectronic and sensing applications.

show abstract

Metasurface based on cross-shaped plasmonic nanoantennas as chemical sensor for surface-enhanced infrared absorption spectroscopy

Cited by 37 publications

References 33 publications

Design of CMOS-compatible metal–insulator–metal metasurfaces via extended equivalent-circuit analysis

Design of CMOS-compatible metal–insulator–metal metasurfaces via extended equivalent-circuit analysis

Advanced DNA Detection via Multispectral Plasmonic Metasurfaces

Lithography‐Free Random Bismuth Nanostructures for Full Solar Spectrum Harvesting and Mid‐Infrared Sensing

Contact Info

Product

Resources

About