2005
DOI: 10.1088/0960-1317/15/10/020
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Metallic submicrometer sieves fabricated by interferometric lithography and electroforming

Abstract: We propose and demonstrate a low cost technique to fabricate submicrometer sieves using the association of laser interference lithography and nickel electroforming. The sieves are fabricated on glass substrates and are released from the substrate by adding a hexagonal sustaining structure, electroformed in nickel, using conventional lithography. The resulting sieves are free self-sustained membranes similar to those used in filtration devices, with typical diameters of the holes of about 250 nm and areas of ab… Show more

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Cited by 17 publications
(18 citation statements)
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“…3(b)). Although the interference lithography may generate a large variety of "r/a" ratios, there are preferential geometries that are less sensitive to the process errors [20].…”
Section: The Fabrication Processmentioning
confidence: 99%
“…3(b)). Although the interference lithography may generate a large variety of "r/a" ratios, there are preferential geometries that are less sensitive to the process errors [20].…”
Section: The Fabrication Processmentioning
confidence: 99%
“…36 (PLLA). 27,37,39,40 However, no molecular transport data revealing the performance of these devices have been presented thus far.…”
Section: Introductionmentioning
confidence: 99%
“…There are several papers concerning micro-sieve fabrication (Rijn et al, 1999;Gutierrez-Rivera et al, 2005;Gutierrez-Rivera et al, 2008), but the characterization of such sieves has concentrated on studies of flux (Brans et al, 2006) and fouling effects (Chandler and Zydney, 2006). The ability of the sieves to separate particles by size or size exclusion is much less investigated in the literature.…”
Section: Introductionmentioning
confidence: 99%