2018
DOI: 10.1021/acsami.8b00813
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Metallic Ni3S2 Films Grown by Atomic Layer Deposition as an Efficient and Stable Electrocatalyst for Overall Water Splitting

Abstract: We describe the direct preparation of crystalline NiS thin films via atomic layer deposition (ALD) techniques at temperatures as low as 250 °C without postthermal treatments. A new ALD chemistry is proposed using bis(1-dimethylamino-2-methyl-2-butoxy) nickel(II) [Ni(dmamb)] and HS as precursors. Homogeneous and conformal depositions of NiS films were achieved on 4 in. wafers (both metal and oxide substrates, including Au and SiO). The resulting crystalline NiS layers exhibited highly efficient and stable perfo… Show more

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Cited by 79 publications
(60 citation statements)
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“…As displayed in Figure 4d, the corresponding Tafel slope of Ni 3 S 2 /NF-DH is calculated to be 50 mV dec À 1 while that of Ni 3 S 2 /NFÀ SH and NF are 93 and 130 mV dec À 1 , signifying that uniformly growth of Ni 3 S 2 on the foam provides abundant exposed active sites and thereby facilitates the penetration of the electrolyte and water-oxidation the kinetics of reaction. [1b] The examined activities of Ni 3 S 2 /NFÀ DH about two reactions outperforms many other previous sulfide nickel by static hydrothermal means (Table S1), such as Ni 3 S 2 films, [25] Ni 3 S 2 nanosheet [11] and Ni 3 S 2 nanowire. [26] The HER and OER activity for Ni 3 S 2 /NF-DH superior to Ni 3 S 2 /NFÀ SH could be attributed to the uniformity of Ni 3 S 2 crystal grown on substrate surface and the facilitated electronic exchanges.…”
Section: Resultsmentioning
confidence: 90%
“…As displayed in Figure 4d, the corresponding Tafel slope of Ni 3 S 2 /NF-DH is calculated to be 50 mV dec À 1 while that of Ni 3 S 2 /NFÀ SH and NF are 93 and 130 mV dec À 1 , signifying that uniformly growth of Ni 3 S 2 on the foam provides abundant exposed active sites and thereby facilitates the penetration of the electrolyte and water-oxidation the kinetics of reaction. [1b] The examined activities of Ni 3 S 2 /NFÀ DH about two reactions outperforms many other previous sulfide nickel by static hydrothermal means (Table S1), such as Ni 3 S 2 films, [25] Ni 3 S 2 nanosheet [11] and Ni 3 S 2 nanowire. [26] The HER and OER activity for Ni 3 S 2 /NF-DH superior to Ni 3 S 2 /NFÀ SH could be attributed to the uniformity of Ni 3 S 2 crystal grown on substrate surface and the facilitated electronic exchanges.…”
Section: Resultsmentioning
confidence: 90%
“…For undoped Ni 3 S 2 , the characteristic Raman peaks at 193.6, 216.4, 301.7, and 341.8 cm À 1 can be assigned to one A 1 and three E vibrational modes of Ni 3 S 2 , [38] which are well matched with the corresponding heazlewoodite phase of Ni 3 S 2 . [11,13,15,39] For Fe 13.7% -Ni 3 S 2 , the peaks are all shifted to a lower wavenumber compared to undoped Ni 3 S 2 , revealing the state of NiÀ S bonds was changed by Fe ions doped into Ni 3 S 2 lattices.…”
Section: Resultsmentioning
confidence: 95%
“…[6][7][8][9] Among these catalysts, nickel-based compounds, e. g. nickel sulfides, have unique configuration and high conductivity, of which abundant NiÀ S and NiÀ Ni bonds can facilitate the production of the intermediate (OOH*) for OER and the adsorbed hydrogen (H*) converted to H 2 for HER, therefore, are employed as promising water splitting electrocatalysts. [10][11][12][13][14][15][16][17] Nickel sulfide with suitable element doping can modulate its electronic and surface structure, hence, significantly enhancing the electrocatalytic performance for OER and (or) HER. Zn, [18] V, [19] Sn, [20] N, [21] Mo, [22] and Fe [23][24][25][26][27][28] elements have been doped in nickel sulfide lattices for promoted OER, HER or overall water splitting electrocatalysis.…”
Section: Introductionmentioning
confidence: 99%
“…where G is the crystallite size,  is the wavelength of X-ray (  = 1.5406 A°). However, the dislocation density  of nickel sulfide thin films was calculated from crystallite size by following relation [35]:…”
Section: Properties Of Nickel Sulfide Films Performed By Spray Pyrolymentioning
confidence: 99%