METAL-DOPED ZnO THIN FILMS: SYNTHESIS, ETCHING CHARACTERISTIC, AND APPLICATION TEST FOR ORGANIC LIGHT EMITTING DIODE (OLED) DEVICES

Abstract

Metal-doped ZnO films with various metal contents ( Al , Ag and Li of 0–10 wt.%) were prepared by RF magnetron sputtering system with specially designed ZnO targets. The structural, optical and electrical properties of MZO films depended on the type and content of doping in target. Electrical resistivity of LZO thin films increased with increasing Li doping amounts between 0 and 4 wt.%, suggesting that an epitaxial LZO film has high resistivity. We observed morphology in pure ZnO films by using different etchant. In addition, etching rate were contrasted with the etchant concentration and pH. The etching rate is proportional exponentially to pH value. These data will be the technical basis for TCO application. Also, the dry etching rate decreased with increasing the Cl 2 concentration in CH 4/ H 2/ Ar + additive Cl 2 gas mixture but metal dopants were etched effectively.

Etching of Crystalline ZnO Surfaces upon Phosphonic Acid Adsorption: Guidelines for the Realization of Well-Engineered Functional Self-Assembled Monolayers

“…By means of TDS, we have proven in a recent study that even upon short exposure to ambient air for a few minutes, almost complete hydroxylation of the ZnO surface takes place . Etching of ZnO crystals has been reported in a number of previous studies. ,,,,, The etching process is commonly described as a dissolution reaction and formation of Zn 2+ cations, , which subsequently may react with organic molecules from the solution, thereby forming complexes and precipitates on the surface by recrystallization. , The general concept of ZnO dissolution involves the following steps: first, a protonation of surface oxo species; second, a rupture of metal–oxygen bonds; and, finally, the transfer of metal ions into the solution . ZnO as an amphoteric oxide can react with both strong acids and bases to form salts and water.…”

“…When providing sufficient thermal energy and time during preparation, this yields exceptionally well ordered SAMs of one phase only . By contrast, on oxidic substrates undesirable side reactions, such as partial dissolution of substrate surfaces, have been reported, ,,,,, which are made responsible for the failure and improper behavior of electronic devices. , Therefore, a closer analysis of the immersion chemistry of such hybrid systems is required. Understanding the chemical robustness of ZnO surfaces is also of interest in the field of corrosion, since Zn/ZnO coatings are commonly used as protection layers for steel sheets, hence raising questions about their chemical stability and possible delamination …”

A novel way of texturing glass for microcrystalline silicon thin film solar cells application

“…As has been reported, HF is an etchant for glass and HNO 3 is an etchant for ZnO:Al . Although HF itself can etch ZnO:Al , HNO 3 is more effective in etching ZnO:Al and plays as the main etchant for ZnO:Al in this process. Therefore, the etching rate for glass increases with increasing HF concentration and the etching rate for ZnO:Al film increases with increasing HNO 3 concentration.…”

Transparent conducting Sn:ZnO films deposited from nanoparticles

“…Transparent conducting oxide (TCO) films show a high optical transmittance in the visible region as well as high electrical conductivity. This unique combination makes TCO films ideal for applications in many current and emerging optoelectronic devices, for example, gas sensors [1][2][3], touch-panel displays [4], liquid crystal displays (LCD) [5], organic light-emitting diodes (OLED) [6][7][8][9][10], smart windows [11] and solar cells [12][13][14]. TCOs such as Sn:In 2 O 3 (ITO) and Al:ZnO (AZO) are well established on an industrial scale.…”