Metal‐Containing Block Copolymer Thin Films Yield Wire Grid Polarizers with High Aspect Ratio

Kim, So Youn; Gwyther, Jessica; Manners, Ian; Chaikin, P. M.; Register, Richard A.

doi:10.1002/adma.201303452

Cited by 59 publications

(67 citation statements)

References 30 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Figure illustrates schematic procedure for the controlled segmentation of metal nanowire arrays. Asymmetric BCP polystyrene‐ block ‐poly(2‐vinylpyridine) (PS‐ b ‐P2VP) thin film was spin‐cast on a substrate and self‐assembled into aligned surface parallel nanocylinder arrays via thermal annealing with external shear stress (Figure S1, Supporting Information) . The resultant nanoscale morphology in the BCP thin film was observed with scanning electron microscope (SEM).…”

Section: Resultsmentioning

confidence: 99%

“…To date, many successful approaches for directed self‐assembly have been introduced to control the orientation and lateral ordering of BCP nanodomains. However, crucial limitations still remain: the direction of self‐assembled BCP nanostructure is subordinate to that of an external guidance such as physical geometry, chemical contrast, external field, and so on. We note a small modification of the presented study can circumvent the limitation.…”

Section: Resultsmentioning

confidence: 99%

See 1 more Smart Citation

Controlled Segmentation of Metal Nanowire Array by Block Copolymer Lithography and Reversible Ion Loading

Mun

Keun

Kim

et al. 2017

Small

Self Cite

View full text Add to dashboard Cite

Spatial arrangement of 1D nanomaterials may offer enormous opportunities for advanced electronics and photonics. Moreover, morphological complexity and chemical diversity in the nanoscale components may lead to unique properties that are hardly anticipated in randomly distributed homogeneous nanostructures. Here, controlled chemical segmentation of metal nanowire arrays using block copolymer lithography and subsequent reversible metal ion loading are demonstrated. To impose chemical heterogeneity in the nanowires generated by block copolymer lithography, reversible ion loading method highly specific for one particular polymer block is introduced. Reversibility of the metal ion loading enables area-selective localized replacement of metal ions in the self-assembled patterns and creates segmented metal nanowire arrays with different metallic components. Further integration of this method with shear aligning process produces high aligned segmented metal nanowire array with desired local chemical compositions.

show abstract

Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

Controlled Segmentation of Metal Nanowire Array by Block Copolymer Lithography and Reversible Ion Loading

Mun

Keun

Kim

et al. 2017

Small

Self Cite

View full text Add to dashboard Cite

show abstract

“…However, processes requiring vacuum evaporation and RIE may be insufficiently cost‐effective and high‐throughput to manufacture Al WGPs. Bottom‐up approaches to fabricate WGPs have been attempted, such as colloidal assembly, metal‐containing block copolymers, and nanowire alignment . However, the limitations of the material selection and structural versatility caused unsatisfactory WGP performance.…”

Section: Introductionmentioning

confidence: 99%

Solution‐Processed Aluminum Nanogratings for Wire Grid Polarizers

Kang

Yun

Jang

et al. 2018

Advanced Optical Materials

View full text Add to dashboard Cite

polarized light, the WGP behaves like a metallic mirror, which reflects the incident light because of its high effective extinction coefficient; for transverse magnetic (TM)-mode polarized light, the WGP acts as a dielectric layer, effectively transmitting the incident light. [4] Al is the most commonly used material for WGPs because its refractive indices having low real and high imaginary parts are adequate in providing high TM transmission and TE reflection ( Figure S1, Supporting Information). [4][5][6] Accordingly, the highest performance for both the TM transmittance and extinction ratio (ratio of TM-to TE-mode transmittances) is expected when using Al compared with other metals ( Figure S1g, Supporting Information). Moreover, Al is one of the most abundant metals on earth, low-cost, light-weight, and environmentally stable. Theoretically, an extinction ratio and TM transmittance exceeding 10 000 and 85%, respectively, are expected from sub-100 nm pitch Al WGP. [5,7] To fabricate high-aspect-ratio Al nanostructures, various fabrication processes have been proposed. Especially, nanoimprint lithography, which can produce polymer nanopatterns almost infinitely through repetitive replication from a single master mold, has been widely used. High-aspect-ratio Al nanostructure was formed on the sidewall of a nanoimprinted polymer template by angled metal evaporation and reactive ion etching (RIE). [8][9][10][11] Nanoimprinted polymer resist was also used as an etch mask to create Al nanostructures using RIE. [7,12] However, processes requiring vacuum evaporation and RIE may be insufficiently cost-effective and highthroughput to manufacture Al WGPs. Bottom-up approaches to fabricate WGPs have been attempted, such as colloidal assembly, [13,14] metal-containing block copolymers, [15] and nanowire alignment. [16][17][18] However, the limitations of the material selection and structural versatility caused unsatisfactory WGP performance. Although the formation of metal structures through both electro-and electroless plating has been proposed, a specifically modified template is required for the site-selective growth of metals. [19][20][21][22] For example, hydrophobic or insulating nanostructure was prepared while exposing the hydrophilic or conducting substrate on the bottom portions of the structures, which requires dry etching or photolithography. [19][20][21][22] Moreover, unlike noble metals, the formation of Al nanostructures using solution processes is rare because of the high reactivity of Al with both oxygen and water. Previous studies The wire grid polarizer (WGP) consisting of parallel metal nanogratings is an attractive alternative to conventional polarizers because it offers thin layer thickness, easy integration capability, and outstanding chemical and thermal stability. In this report, a facile solution process is proposed for fabricating Al WGPs. High-aspect-ratio Al nanostructures are formed in a 1D nanoimprinted template by electroless plating. Because of the geometrically irreversible deposition and ...

show abstract

“…As a consequence, the lateral ordering of the BCP microdomains is significantly promoted. Although thermal annealing is an effective method to create ordered morphologies [4][5][6][7][8][9][10][11], application of high temperatures to BCP thin films may result in the degradation of one or more blocks, causing the final morphology to deteriorate [12][13][14][15][16][17][18][19][20]. This can also bring a loss to the long-range ordering of the morphology [16,17,21].…”

Section: Introductionmentioning

confidence: 99%

Self-assembly of PS-b-PNIPAM-b-PS block copolymer thin films via selective solvent annealing

Cetintas

Kamperman

2016

Polymer

View full text Add to dashboard Cite

Block copolymer (BCP) thin films are interesting material systems for nanofabrication since they can form well-defined periodic nanostructures by microphase separation. However, attaining a specific morphology with the required orientation can be challenging. In this study, we investigated the morphological behavior of polystyrene-b-poly(N-isopropylacrylamide)-bpolystyrene (PS-b-PNIPAM-b-PS) BCP thin films by using Atomic Force Microscopy (AFM) and in-situ Grazing-Incidence X-ray Scattering (GISAXS) during selective solvent annealing. Thin films of a lamellar BCP were annealed by using various solvents with different selectivity for the blocks, such as PNIPAM-selective methanol, non-selective tetrahydrofuran (THF) and PS-selective toluene. Solvent annealing using methanol: THF 1:2 (v:v) or methanol: toluene 1:1 (v:v) resulted in the formation of hexagonally ordered perpendicular cylinders, whereas no sustained long-range order was found when only one type of solvent was used. PS-b-PNIPAM-b-PS BCP thin films that have hexagonally ordered perpendicular cylinders are promising for applications where thermo-responsiveness is desired, such as nanofiltration and biomedical applications.

show abstract

Metal‐Containing Block Copolymer Thin Films Yield Wire Grid Polarizers with High Aspect Ratio

Cited by 59 publications

References 30 publications

Controlled Segmentation of Metal Nanowire Array by Block Copolymer Lithography and Reversible Ion Loading

Controlled Segmentation of Metal Nanowire Array by Block Copolymer Lithography and Reversible Ion Loading

Solution‐Processed Aluminum Nanogratings for Wire Grid Polarizers

Self-assembly of PS-b-PNIPAM-b-PS block copolymer thin films via selective solvent annealing

Contact Info

Product

Resources

About