2006
DOI: 10.1016/j.solmat.2005.04.013
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Metal contact properties of poly3-octylthiophene thin films

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Cited by 7 publications
(7 citation statements)
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“…Ohmic behavior Rectifying behavior Height barrier equals to zero (Rhoderick & Williams, 1998;Salinas et al, 2006;Sze, 1990) Barrier height positive and not equal to zero.…”
Section: Metal -Nps Junctionmentioning
confidence: 99%
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“…Ohmic behavior Rectifying behavior Height barrier equals to zero (Rhoderick & Williams, 1998;Salinas et al, 2006;Sze, 1990) Barrier height positive and not equal to zero.…”
Section: Metal -Nps Junctionmentioning
confidence: 99%
“…The crystalline silicon industry is mature and manufactures electronic devices, and thus, the M -S interface issues have already been overcome or at least minimized. When a metal and a semiconductor are in intimate contact because the work functions of both materials are different, a built-in barrier is created at their interface (Salinas et al, 2006), which is called a Schottky barrier. The barrier height is directly related to the difference in the Fermi levels between the metal and semiconductor material.…”
Section: Metal -Nps Junctionmentioning
confidence: 99%
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“…A thin Au grid (30 nm) was deposited by sputtering through a mask onto the PMeT film, and also a thin Au film (50 nm) was sputtered onto the bottom of Si wafer. Au electrode to the PMeT films showed Ohmic characteristics [18]. In control experiments, the PMeT layers of the devices were de-doped in hydrazine hydrate after electrochemical deposition, and Au electrodes were fabricated under the same conditions as described above.…”
Section: Fabrication Of the Solar Cellsmentioning
confidence: 99%