Metal atom behavior on photochromic diarylethene surfaces—deposition rate dependence of selective Mg deposition

Tsujioka, Tsuyoshi; Sesumi, Yusuke; Yokojima, Satoshi; Nakamura, Shinichiro; Uchida, Kôji

doi:10.1039/b823040d

Cited by 16 publications

(12 citation statements)

References 18 publications

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“…The parameters other than T g that affect metal‐atom desorption are the metal‐atom deposition rate (density on the surface), substrate temperature, gas pressure during the metal evaporation, surface viscosity, and the metal species themselves. Low deposition rate, high temperature, low gas pressure, and/or low viscosity facilitate easy desorption.…”

Section: Selective Metal‐vapor Deposition On Amorphous Photochromic Dmentioning

confidence: 99%

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Selective Metal-vapor Deposition on Organic Surfaces

Tsujioka

2015

The Chemical Record

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Selective metal-vapor deposition signifies that metal-vapor atoms are deposited on a hard organic surface, but not on a soft (low glass transition temperature, low Tg ) surface. In this paper, we introduce the origin, extension, and applications of selective metal-vapor deposition. An amorphous photochromic diarylethene film shows light-controlled selective metal-vapor deposition, which is caused by a large Tg change based on photoisomerization, but various organic surfaces, including organic crystal and polymers, can be utilized for achieving selective metal-vapor deposition. Various applications of selective metal-vapor deposition, including cathode patterning of organic light-emitting devices, micro-thin-film fuses, multifunctional diffraction gratings, in-plane electrical bistability for memory devices, and metal-vapor integration, have been demonstrated.

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Section: Selective Metal‐vapor Deposition On Amorphous Photochromic Dmentioning

confidence: 99%

“…Mg‐vapor deposition depends heavily on the deposition rate ( R d ) (Figure ) . At R d = 1 nm s −1 , Mg deposits on the colored surface, but not on the colorless surface; this is selective Mg‐vapor deposition.…”

Section: Selective Metal‐vapor Deposition On Amorphous Photochromic Dmentioning

confidence: 99%

Selective Metal-vapor Deposition on Organic Surfaces

Tsujioka

2015

The Chemical Record

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“…The other parameters, except T g , that affect the metal atom deposition (or desorption) are the metal deposition rate, 6,7 substrate temperature, 8 the gas pressure during the metal evaporation, 9 the surface viscosity, 10 and metal species. A high deposition rate, low temperature, high pressure, and/or high viscosity facilitate easy deposition.…”

Section: Selective Metal Deposition On Amorphous Dae Surfacesmentioning

confidence: 99%

Selective metal deposition on organic surfaces for device applications

Tsujioka

2014

J. Mater. Chem. C

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“…This method is based on selective metal deposition on a photochromic diarylethene (DAE) surface. 10,11 Photochromism is defined as the reversible structural interconversion between two isomers with different colors upon irradiation by light at different wavelengths. 12 Photochromism, however, is currently redefined as various property changes in a molecule, films, or crystal state.…”

Section: Introductionmentioning

confidence: 99%