2006
DOI: 10.1016/j.nimb.2006.10.060
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Metal and organic contamination effects on the characteristics of thin oxides thermally grown on silicon based wafers

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“…Conversion rates of 1%-5% have been reported for a He + energy range of 3 keV to 25 keV [2][3][4][5][6]. However, metals are contaminants in semiconductor fabrication [7] influencing transistor threshold voltages [8]. Residual alkali metal vapour can also deposit on the interior of vacuum chambers, is hazardous to maintain, and if near electrostatic devices, can lead to increased rates of unwanted discharge.…”
Section: Introductionmentioning
confidence: 99%
“…Conversion rates of 1%-5% have been reported for a He + energy range of 3 keV to 25 keV [2][3][4][5][6]. However, metals are contaminants in semiconductor fabrication [7] influencing transistor threshold voltages [8]. Residual alkali metal vapour can also deposit on the interior of vacuum chambers, is hazardous to maintain, and if near electrostatic devices, can lead to increased rates of unwanted discharge.…”
Section: Introductionmentioning
confidence: 99%