Mercury‐sensitized photochemical vapor deposition of amorphous silicon

Albright, David; Saxena, Neeraj K.; Fortmann, C.M.; Rocheleau, Richard; Russell, T. W. F.

doi:10.1002/aic.690361011

Cited by 12 publications

(1 citation statement)

References 22 publications

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“…Details about this method and growth parameters are given elsewhere. 5 A semitransparent palladium contact was evaporated onto the samples to provide a Schottky barrier for both the junction modulated photocurrent and junction capacitance measurements. We have demonstrated that modulated photocurrent spectroscopy is a powerful technique to determine the energy distribution of the relaxed DO sub-band in a-Si:H. 3 Fast light emitting diodes with peak fluxes at different wavelengths were used as sinusoidal excitation sources over frequency range from 5Hz to 100kHz.…”

Section: Experimental Techniquesmentioning

confidence: 99%

Observation of Deep Defect Relaxation Processes in Hydrogenated Amorphous Silicon-Germanium Alloy

Fan

Cohen

1993

MRS Proc.

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Modulated photocurrent (MPC) spectroscopy has been used to investigate the energy distribution of deep defect states in photo-CVD grown a-SilxGex:H alloys. We observe a distinct electron trapping feature at a thermal energy of 0.55eV below Ec for higher Ge concentration (x = 0.62) alloys. For those samples with Ge concentration between 30-50 at.%, an anomalously large phase shift was observed within a temperature window between 150K to 240K. The modulated photocurrent exhibits strong quenching at the edges of this window. We suggest that these MPC spectra are controlled by deep defect relaxation processes in this temperature region, which causes electron thermal emission processes to be greatly suppressed. This effect can be reduced by increasing the reverse bias. Under such conditions, the energy position of these defect states can be roughly estimated to lie near Ec -0.33eV. This result supports the recent result obtained from transient photocapacitance and photocurrent measurement.

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Section: Experimental Techniquesmentioning

confidence: 99%