2013
DOI: 10.1021/nn403057t
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Meniscus-Mask Lithography for Narrow Graphene Nanoribbons

Abstract: Described here is a planar top-down method for the fabrication of precisely positioned very narrow (sub-10 nm), high aspect ratio (>2000) graphene nanoribbons (GNRs) from graphene sheets, which we call meniscus-mask lithography (MML). The method does not require demanding high-resolution lithography tools. The mechanism involves masking by atmospheric water adsorbed at the edge of the lithography pattern written on top of the target material. The GNR electronic properties depend on the graphene etching method,… Show more

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Cited by 59 publications
(51 citation statements)
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“…To date, the best known methods for synthesizing quasi-one dimensional graphene nanostructures include the following primary categories: [1] The top-down approach, which utilizes lithographic techniques to produce GNRs from two-dimensional graphene sheets on a substrate. The quantities of GNRs thus produced are limited due to the time consuming lithographic processes, and the edges of these GNRs are usually jagged [25,26]. [2] The bottom-up approach, which may be further divided into the surface-assisted [27,28] and solution-phase synthesized [29e35] approaches.…”
Section: Introductionmentioning
confidence: 99%
“…To date, the best known methods for synthesizing quasi-one dimensional graphene nanostructures include the following primary categories: [1] The top-down approach, which utilizes lithographic techniques to produce GNRs from two-dimensional graphene sheets on a substrate. The quantities of GNRs thus produced are limited due to the time consuming lithographic processes, and the edges of these GNRs are usually jagged [25,26]. [2] The bottom-up approach, which may be further divided into the surface-assisted [27,28] and solution-phase synthesized [29e35] approaches.…”
Section: Introductionmentioning
confidence: 99%
“…[ 115 ] They demonstrated anisotropic etching of SLG by thermally activated nickel nanoparticles in a H 2 atmosphere at 1000 °C, as illustrated in Figure 13 a. The crystallographically oriented cuts in SLG oriented at the same edge-chirality (60° or 120°) ( Figure 13 The characteristic width via different fabrication methods, including patterning graphene, [ 20,37,[39][40][41][42][43]46,47,54,57,59,62,63 ] unzipping CNTs, [ 34,65,68,71 ] template growth [72][73][74] and solution/ surface-assisted synthesis. [ 20,78,79,81,[83][84][85][86][87][88] (17 of 31) 1500456 wileyonlinelibrary.com REVIEW connected nanostructured graphene with width lower than 10 nm.…”
Section: Edge Controlmentioning
confidence: 99%
“…Top-down lithography methods based on defi ned masks are the most feasible and convenient way to fabricate nanostructured graphene from large-area graphene fi lms with facile device placement and device addressing. [ 20,[37][38][39][40][41][42][43][44][45] The modes labeled with R, E, and L represent the RBLM, the graphene E 2g -like mode, and the localized mode, respectively. c) The RBLM of all calculated CNRs with H saturation.…”
Section: Nano-masking Lithographymentioning
confidence: 99%
“…ESσ↓ is located near the Fermi level in the band gap of π-band [8,9] in the narrow GNR. (A GNR with dozen nanometer width is created from an unzipping carbon nanotube [10] or by using a meniscus-mask lithography method [11]. )…”
Section: Introductionmentioning
confidence: 99%