“…A complicating factor in the use of UO 2 is its high melting point, 2805 °C, 17 which can potentially limit its applications. Sputtering has traditionally been used for fabricating thin films, 18 while sol-gel methods, 14,[19][20][21] hydrothermal syntheses, 4,[22][23][24][25][26][27] gamma ray or electron beam irradiation, [28][29][30] and galvanostatic reduction of uranyl 31,32 have been used for the synthesis of UO 2 nanoparticles. Sol-gel methods and hydrothermal syntheses are the most practical because these techniques generally involve straightforward preparations.…”