Mechanisms of photoresist dissolution

Hunek, Balazs; Cussler, E. L.

doi:10.1002/aic.690480403

Cited by 26 publications

(20 citation statements)

References 15 publications

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“…In recent work by Hunek and Cussler the dissolution of a novolac resin was analyzed using a spinning disk method. 62 They concluded from their kinetic analysis that the dissolution of novolac is best described by a mechanism where both release of ionized polymer from the solid (S3 in their notation) and mass transfer into the liquid phase (S4) are rate-limiting, implying that the two steps have comparable rates. The authors point out that the slow surface release process S3 has been identified in water-soluble polymers such as xanthan and pectin which are known to form swollen gel layers.…”

Section: Resultsmentioning

confidence: 99%

Characterization of Reactive Dissolution and Swelling of Polymer Films Using a Quartz Crystal Microbalance and Visible and Infrared Reflectance Spectroscopy

et al. 2005

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Dissolution and swelling of thin films of ionizable polymers in contact with aqueous alkaline solutions are examined using a quartz crystal microbalance, while simultaneously recording the visible reflectivity and infrared absorption of the evolving films. From these data changes in the thickness, depth structure, composition, mass, and mechanical properties of the polymer film during its interaction with the aqueous solution can be detected. Analysis of these provides evidence for the formation of interfacial gel layers resulting from acid−base reaction of the polymer with the hydroxide solution and yields information on the kinetics of transport and chemical reaction that control the overall process. Kinetics simulations indicate that the most important factors influencing observed behaviors are the intrinsic reactivity of ionizable groups on the polymer and the response of the film's mechanical properties, which determine the ability of small molecules to move through it, to incorporation of water.

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Section: Resultsmentioning

confidence: 99%

Characterization of Reactive Dissolution and Swelling of Polymer Films Using a Quartz Crystal Microbalance and Visible and Infrared Reflectance Spectroscopy

et al. 2005

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“…Quantitative modeling of the uniform removal stage has been improved by Chen and co-workers, utilizing concepts developed for polymer swelling and dissolution (e.g., [38]) to model the removal of swollen protein fragments [39]. This work will allow fouling-cleaning models to be developed for process optimization and equipment design.…”

Section: Case Study: Whey Protein Cleaningmentioning

confidence: 98%

Challenges in Cleaning: Recent Developments and Future Prospects

Wilson

2005

Heat Transfer Engineering

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“…Techniques, such as a dissolution rate monitor, 10,15,16 ellipsometry, 17,18 and the quartz crystal microbalance (QCM) [18][19][20][21][22][23] have been employed to measure photoresist dissolution in aqueous solutions. A dissolution rate monitor has been use to monitor high pressure dissolution of fluorinated photoresists, but real time acquisition is limited when CO 2 is initially added to the system and the He-Ne beam scatters.…”

Section: Introductionmentioning

confidence: 99%

Monitoring photoresist dissolution in supercritical carbon dioxide using a quartz crystal microbalance

Zweber

Carbonell

2006

SPIE Proceedings

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New lithographic techniques are being implemented to help further reduce feature sizes in microelectronics. A technique for the development of standard commercial extreme ultraviolet (EUV) photoresists in a carbon dioxide compatible salt (CCS) and supercritical carbon dioxide (scCO 2 ) solution is being investigated to reduce line edge roughness and image collapse of high aspect ratio features. 1, 2 To understand the kinetics and overall mechanism of photoresist dissolution into the high pressure CCS/scCO 2 solution, we use a quartz crystal microbalance (QCM). QCM measures the frequency changes of the quartz crystal when mass loadings, temperature, pressure, and solution viscosity change. In the last decade, QCM has been used to monitor dissolution of photoresist materials in liquid solutions in real time. 3 The technique has been adapted to high pressure systems, with corrections for pressure and solution viscosity effects. 4 In this paper, QCM was used in high pressure scCO 2 conditions to monitor the dissolution kinetics of the photoresist using the CCS/scCO 2 solution. The frequency changes of the quartz crystal were recorded and corrected for both pressure and solution viscosity to estimate the mass removed as a function of time. The initial photoresist dissolution rates in the CCS/scCO 2 solution at temperatures between 35 o C and 50 o C and pressures ranging from 3500 psi to 5000 psi are reported. The plots of photoresist removal with time are linear signifying a zero order overall removal rate. The activation energy for photoresist removal at a CO 2 density of 0.896 g/ml is 76 mJ/mol.

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Mechanisms of photoresist dissolution

Cited by 26 publications

References 15 publications

Characterization of Reactive Dissolution and Swelling of Polymer Films Using a Quartz Crystal Microbalance and Visible and Infrared Reflectance Spectroscopy

Characterization of Reactive Dissolution and Swelling of Polymer Films Using a Quartz Crystal Microbalance and Visible and Infrared Reflectance Spectroscopy

Challenges in Cleaning: Recent Developments and Future Prospects

Monitoring photoresist dissolution in supercritical carbon dioxide using a quartz crystal microbalance

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