2021
DOI: 10.1016/j.tsf.2021.138629
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Mechanisms of carrier lifetime enhancement and conductivity-type switching on hydrogen-incorporated arsenic-doped BaSi2

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Cited by 9 publications
(8 citation statements)
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“…H incorporation has also been reported to be an efficient and feasible way to increase the photoresponsivity of Bdoped and As-doped BaSi 2 . [53,56]…”
Section: Hydrogen Passivation Of Undoped Basimentioning
confidence: 99%
See 1 more Smart Citation
“…H incorporation has also been reported to be an efficient and feasible way to increase the photoresponsivity of Bdoped and As-doped BaSi 2 . [53,56]…”
Section: Hydrogen Passivation Of Undoped Basimentioning
confidence: 99%
“…[38,39] By positron annihilation spectroscopy, [39] it has been revealed that the electron concentration increases to %10 18 cm À3 with increasing vacancy-type defects [38] when the Ba/Si atomic ratio is far from the stoichiometric ratio. In addition, novel device structures have been proposed, [40][41][42][43][44][45][46][47][48][49][50] and passivation of defects in BaSi 2 has been demonstrated by atomic-hydrogen (H) [51][52][53][54][55][56] and carbon (C) doping. [27,30,57] For deposition techniques, vacuum evaporation of BaSi 2 granules [21][22][23][24][25] and sputtering of BaSi 2 targets [26][27][28][29][30] or cosputtering of Si and Ba targets [31] are suitable to form BaSi 2 films for large-scale deployment on inexpensive substrates like SiO 2 .…”
Section: Introductionmentioning
confidence: 99%
“…The valence band maximum of BaSi 2 primarily consists of Si 3s and 3p orbitals 30–33 ; therefore, replacement of some of the Si atoms in BaSi 2 with group 15 elements such as P, As, and Sb increases the electron concentration of BaSi 2 . We have also succeeded in controlling electron concentrations through MBE using As in the role of n‐type impurity 34,35 and achieved high photoresponsivity of As‐doped n‐BaSi 2 films by atomic H treatment 36,37 . However, the conductivity type of As‐doped BaSi 2 films sometimes switches from n‐type to p‐type 37 .…”
Section: Introductionmentioning
confidence: 96%
“…We have also succeeded in controlling electron concentrations through MBE using As in the role of ntype impurity 34,35 and achieved high photoresponsivity of As-doped n-BaSi 2 films by atomic H treatment. 36,37 However, the conductivity type of As-doped BaSi 2 films sometimes switches from n-type to ptype. 37 Among P, As, and Sb, P is not easy to handle by sputtering or MBE methods because of its high vapor pressure and reactivity.…”
Section: Introductionmentioning
confidence: 99%
“…30) Marked enhancement of photoresponsivity was also demonstrated for H-, B-, and Asdoped BaSi 2 films and their passivation mechanisms were discussed based on the first-principles calculation. [34][35][36] However, there have been no studies thus far on how much damage Ar ions may cause in sputter-deposited BaSi 2 films and thereby the BaSi 2 /Si heterointerface. This investigation is inevitable prior to the formation of BaSi 2 devices by sputtering.…”
mentioning
confidence: 99%