2013
DOI: 10.1016/j.ccr.2013.07.001
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Mechanisms and reactions during atomic layer deposition on polymers

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Cited by 185 publications
(199 citation statements)
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“…10,19,20 The ALD growth on polymers is strongly dependent on the nature of the polymer and on the ALD precursors. 11,21 For some polymers, reactive sites that can covalently bind the reactants at the initial stages of deposition are not available and the deposition initiates only after a certain number of cycles. 22 Many polymers are permeable to small molecules, which allow the diffusion of the precursors into the bulk.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…10,19,20 The ALD growth on polymers is strongly dependent on the nature of the polymer and on the ALD precursors. 11,21 For some polymers, reactive sites that can covalently bind the reactants at the initial stages of deposition are not available and the deposition initiates only after a certain number of cycles. 22 Many polymers are permeable to small molecules, which allow the diffusion of the precursors into the bulk.…”
Section: Introductionmentioning
confidence: 99%
“…22 The subsurface growth affects on the structure of the polymer substrate/film interface as well as the surface roughness of the film. 21,22 Parsons et al 21 introduced another possible mechanism for TMA reaction with PMMA. In this mechanism, the Lewis-acidic TMA reacts with the Lewis-basic carbonyl groups on PMMA side-chains.…”
Section: Introductionmentioning
confidence: 99%
“…The ALD of oxide materials on cotton and other polymeric substrates differs significantly from ALD on standard substrate materials such as silicon or glass. [18] First of all, in comparison to silicon, the fibers of the cotton substrate form a porous-type fine-structure with features of ≈10 µm in size. This requires much longer pulse and purge times during the ALD to attain even growth of the film.…”
Section: Thin-film Fabrication and Structural Characteristicsmentioning
confidence: 99%
“…[18] However, cellulosic cotton is an example of a natural polymer with a large density of surface hydroxyl groups, which may help the precursors to react at the surface, thus preventing the subsurface diffusion. [18] To study the nature of ALD of ZnO on our cotton substrates, we carried out the ZnO depositions both for pristine cotton substrates and for cotton substrates coated with predeposited Al 2 O 3 . The ALD of Al 2 O 3 was carried out with the standard trimethyl aluminum (TMA) and H 2 O precursors, and since TMA is known to react readily with the surface hydroxyls of cellulosic cotton, such predeposition can improve the quality of the deposited ZnO thin films.…”
Section: Thin-film Fabrication and Structural Characteristicsmentioning
confidence: 99%
“…The key distinction between the ALD and SIS techniques is that the latter one can provide the bulk synthesis of the inorganic material when employed on polymers (or any other porous structures) [11][12][13]. For that the precursors exposure times are extended in SIS compared to ALD to facilitate diffusion into the volume of the organic film.…”
Section: Introductionmentioning
confidence: 99%