Mechanism of rf reactive sputtering

Abstract

The reactive mechanism of rf reactive sputtering has been investigated by mass spectrometry in an rf diode sputtering system. The result indicates that the gettering action of the sputtered active atom deposits influences the progress of reactive sputtering in addition to the target reaction. A model, taking the gettering action into consideration, is presented for the reactive sputtering of a metal. This model shows that an abrupt steplike decrease in the sputtering rate may occur at a definite partial pressure of a reactive gas p* in the plasma. The pressure p* is determined from the gettering rate of the sputtered deposits relative to the throughput of the reactive gas. The value of the pressure p* calculated on this model is in good agreement with the experimental results.

Effect of Ar Gas Pressure on Morphology and Structure of Nonequilibrium Fe–Cu Alloys Produced by rf Sputtering

“…The halfwidth of diffraction lines is broadened due to Ar contamination, lattice defects, residual strain and a small grain size in the sputter-deposited alloys. If the line broadening is ascribed completely to the grain size, the average grain sizes are about [10][11][12][13][14][15][16][17][18][19][20] run, being in agreement with those estimated from the transmission electron micrograph. Figure 7 shows the lattice constants of Fe1-xCux alloys sputter-deposited under several values of PAr.…”

One-step synthesis of crystalline Mn2O3 thin film by ultrasonic spray pyrolysis

“…[5][6][7] In addition, metaloxides are inherently low cost, and simple to fabricate in the nanoscale level with large range of techniques such as pulse laser deposition, RF sputtering, spray pyrolysis and electrochemical deposition. [8][9][10][11] Dimanganese trioxide (Mn 2 O 3 ) is one metal-oxide out of several stable oxidation states of metallic manganese including MnO, Mn 2 O 3 , Mn 3 O 4 and MnO 2 . These oxidation states differ by their properties such as band gap, resistivity and Seebeck coefficients.…”

Nanostructured ATO Anodes Produced by RF Magnetron Sputtering for Li-Ion Batteries

“…The peaks become more intense and sharper with the increase in RF power. This suggests that the crystallinity of the resulting lm increases and the grain size becomes larger with increasing RF power (under the oxide region of the Shinoki model [19], where the crystallinity was enhanced with increasing RF power) [20,21]. Fig.…”