2018
DOI: 10.3389/fmats.2018.00041
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Mechanical Properties of Nanostructured CoCrFeNiMn High-Entropy Alloy (HEA) Coating

Abstract: An equiatomic CoCrFeMnNi high-entropy alloy (HEA) thin film coating has been successfully developed by high-vacuum Radio Frequency (RF) magnetron sputtering. The deposition of a smooth and homogenous thin film with uniformly distributed equiaxed nanograins (grain size ∼ 10 nm) was achieved through this technique. The thin film coating exhibits a high hardness of 6.8 ± 0.6 GPa, which is superior compared to its bulk counterpart owing to its nanocrystalline structure. Furthermore, it also shows good ductility th… Show more

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Cited by 47 publications
(10 citation statements)
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“…shows the hardness values as determined using Vickers Microhardness testing. The exceptionally high hardness demonstrated by the as-cast alloy is comparable to many reported HEAs(Dang et al, 2018;Long et al, 2019) [52]…”
supporting
confidence: 78%
“…shows the hardness values as determined using Vickers Microhardness testing. The exceptionally high hardness demonstrated by the as-cast alloy is comparable to many reported HEAs(Dang et al, 2018;Long et al, 2019) [52]…”
supporting
confidence: 78%
“…Yu et al [8] prepared CoCrFeCuNi and CoCrFeMnNi high-entropy alloys via mechanical alloying and high-pressure sintering (HPS) and found that the bulk modulus is 117.5 GPa and 136.1 GPa for the HPSed CoCrFeCuNi and CoCrFeMnNi HEAs, respectively. Dang et al [9] adapted high-vacuum radio frequency magnetron sputtering to obtain an equiatomic CoCrFeMnNi high-entropy alloy thin film and investigated its mechanical properties. Their results showed that the deposition of a smooth and homogenous thin film with a grain size of ~10 nm is achieved through this technique.…”
Section: Introductionmentioning
confidence: 99%
“…Marshal et al (2019) fabricated HEAs thin films using the same alloy as a target by direct current magnetron sputtering deposition process and the results also showed improvements in the properties of the alloys. Dang et al (2018) used a high-vacuum radio frequency magnetron sputtering process to develop HEA thin films also using the films as the target and they stated that the films had the Nano-grain size of approximately 10 nm which can be applicable for micro-fabrication. On the other hand, Nagy et al (2020) developed a novel multiple-beam sputtering that uses commercial pure metal targets instead of the conventional use of the HEAF targets.…”
Section: Advances In Manufacturing Technologymentioning
confidence: 99%