Mechanical properties of Cu–Al–O thin films prepared by plasma-enhanced chemical vapor deposition

Abstract

Mechanics of hydrogenated amorphous carbon deposits from electron-beam-induced deposition of a paraffin precursor J. Appl. Phys. 98, 014905 (2005); 10.1063/1.1940138Effects of thermal annealing on the structural, mechanical, and tribological properties of hard fluorinated carbon films deposited by plasma enhanced chemical vapor deposition