2020
DOI: 10.1016/j.surfcoat.2020.126474
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Mechanical properties of CoCrCuFeNi multi-principal element alloy thin films on Kapton substrates

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Cited by 17 publications
(12 citation statements)
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“…Furthermore, Kapton demonstrates a high adhesion energy, providing a strong bond for excellent adhesion with thin films. 30,39 Fluorescent nitrogen-doped carbon quantum dots (NCQDs) have emerged as a novel class of zero-dimensional (0D) biocompatible materials with outstanding optical and electronic properties. 40 Although NCQDs possess high photogenerated carrier mobility, tunable band gap, and bifunctional electron donor and acceptor capability.…”
Section: ■ Introductionmentioning
confidence: 99%
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“…Furthermore, Kapton demonstrates a high adhesion energy, providing a strong bond for excellent adhesion with thin films. 30,39 Fluorescent nitrogen-doped carbon quantum dots (NCQDs) have emerged as a novel class of zero-dimensional (0D) biocompatible materials with outstanding optical and electronic properties. 40 Although NCQDs possess high photogenerated carrier mobility, tunable band gap, and bifunctional electron donor and acceptor capability.…”
Section: ■ Introductionmentioning
confidence: 99%
“…Recently, two-dimensional (2D) layer materials such as molybdenum disulfide (MoS 2 ) have gained a lot of interest in modern device development due to their excellent flexibility, high mechanical strength, tunable band gap, and optical characteristics. However, it has been discovered that MoS 2 thin films have in-plane mechanical stiffness comparable to steel, making it an intriguing material for various flexible applications. , In this regard, polyimides such as Kapton have garnered considerable attention due to their unique properties, particularly low Young’s moduli. Furthermore, Kapton demonstrates a high adhesion energy, providing a strong bond for excellent adhesion with thin films. , …”
Section: Introductionmentioning
confidence: 99%
“…With the appropriate inputs, the interfacial shear stress, τ IFSS , or the apparent fracture toughness, K app , of a film can be calculated [ 1 , 14 23 ]. The τ IFSS indicates the amount of shear stress that an interface can withstand before fracture and the K app is a quantitative way to define a film’s resistance to through thickness crack propagation.…”
Section: Introductionmentioning
confidence: 99%
“…Indeed, when a metal or an oxide is deposited on a flexible substrate, it is subjected to high mechanical stress due to the stretching or curvature of the system and the inorganic/organicinterfacial adhesion [61][62][63][64][65][66][67][68][69][70][71][72][73]. There remain important challenges in this area is especially to understand the phenomena of multi-cracking when applying large strains [74][75][76][77][78][79][80][81] and the related effects on magnetic properties.…”
Section: Introductionmentioning
confidence: 99%