Mechanical performance and growth characteristics of boron nitride films with respect to their optical, compositional properties and density

Panayiotatos, Y.; Patsalas, P.; Charitidis, Costas A.; Logothetidis, S.

doi:10.1016/s0257-8972(01)01624-3

Cited by 12 publications

(6 citation statements)

References 14 publications

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“…5 nm. 49 The calculated film density depends slightly on the ratio (Z/A) of the mean atomic number Z to atomic mass A. The BN film density can also be used as a criterion for the sp 3 -bonded c-BN content (3 .…”

Section: X-ray Diffraction (Xrd)mentioning

confidence: 99%

Review of synthesis and properties of cubic boron nitride (c-BN) thin films

Samantaray¹,

Singh²

2005

International Materials Reviews

124

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Cubic boron nitride (c-BN) thin films are of significant interest because of their diamond like structure and properties. c-BN shows high thermal conductivity, chemical inertness against ferrous metals even at high temperatures, wide band gap, and good transmittance over a wide spectral range from UV to visible. Applications of c-BN include hard protective coatings for cutting tools, in optical instruments as UV detectors, as emitters, and in high temperature electronic devices. However, synthesis of phase pure c-BN thin films continues to be very challenging. The present study reviews the current status of the synthesis, characterisation, mechanical, electrical, and optical properties of c-BN thin films. Both physical and chemical vapour deposition methods used for the preparation of the c-BN films are covered. In addition, different nucleation and growth models of c-BN formation and growth on different substrates are described. The influence of process parameters such as ion energy, growth temperatures, chemical precursors, bias, and impurities on the nucleation and growth is reviewed. Mechanical properties including hardness, elastic modulus, and stiffness of c-BN films are discussed. The latest developments in electrical properties of the c-BN films based on metal-insulatorsemiconductor (MIS) hetero-structures, interface states, impurity states, conduction mechanism, field emission properties, and negative electron affinity (NEA) are presented. The optical properties and cathodoluminescence characteristics of BN films are also discussed.

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Section: X-ray Diffraction (Xrd)mentioning

confidence: 99%

Review of synthesis and properties of cubic boron nitride (c-BN) thin films

Samantaray¹,

Singh²

2005

International Materials Reviews

124

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“…All films have been grown at RT in order to grow amorphous AlN; amorphous III-nitrides exhibit ultra smooth surfaces, while they are retaining their high hardness values [20]. Selected-area electron diffraction (SAED) revealed that the Ag nanoparticles exhibited the fcc crystal structure with lattice parameter almost identical to that of pure, unstressed Ag (Fig.…”

Section: Resultsmentioning

confidence: 99%

Structure, stability and mechanical performance of AlN:Ag nanocomposite films

Lotsari

Dimitrakopulos

Kehagias

et al. 2010

Surface and Coatings Technology

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“…BN layers were applied in electron-field emitters, high-temperature dielectrics, tribological devices, and optoelectronic systems [19][20][21]. BN material can be also used in solar cell industry as it can be implemented at high temperature [22][23][24][25]. It is noteworthy to mention that cubic boron nitride c-BN displays unique characteristics such as high thermal conductivity, wide band gap, extreme hardness, and negative electron affinity [26][27][28][29][30][31][32][33][34].…”

Section: Boron Nitride (Bn) Thin Filmsmentioning

confidence: 99%

A brief overview of RF sputtering deposition of boron carbon nitride (BCN) thin films

2018

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A great part of interest has been paid for fabricating new materials with novel mechanical, optical, and electrical properties. Boron carbon nitride (BCN) ternary system was applied for variable bandgap semiconductors and systems with extreme hardness. The purpose of this literature review is to provide a brief historical overview of B 4 C and BN, to review recent research trends in the BCN synthesizes, and to summarize the fabrication of BCN thin films by plasma sputtering technique from B 4 C and BN targets in different gas atmospheres. Pre-set criteria are used to discuss the processing parameters affecting BCN performance which includes the gasses flow ratio and effect of temperature. Moreover, many characterization studies such as mechanical, etching, optical, photoluminescence, XPS, and corrosion studies of the RF sputtered BCN thin films are also covered. We further mentioned the application of BCN thin films to enhance the electrical properties of metal-insulator-metal (MIM) devices according to a previous report of Prakash et al. (Opt. Lett. 41, 4249, 2016).

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Mechanical performance and growth characteristics of boron nitride films with respect to their optical, compositional properties and density

Cited by 12 publications

References 14 publications

Review of synthesis and properties of cubic boron nitride (c-BN) thin films

Review of synthesis and properties of cubic boron nitride (c-BN) thin films

Structure, stability and mechanical performance of AlN:Ag nanocomposite films

A brief overview of RF sputtering deposition of boron carbon nitride (BCN) thin films

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