A brief overview of RF sputtering deposition of boron carbon nitride (BCN) thin films

Zagho, Moustafa M.; Dawoud, Hana D.; Bensalah, Nasr

doi:10.1007/s42247-018-0018-9

Cited by 21 publications

(11 citation statements)

References 124 publications

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“…The transfer of momentum ejects the particles from the target, condensing them on the substrate. This technique is considered particularly reliable for thick c-BN and for BCN coatings on cutting tools with high resistance surfaces [86].…”

Section: Making Of 2d Bn Materialsmentioning

confidence: 99%

From 2-D to 0-D Boron Nitride Materials, The Next Challenge

2019

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The discovery of graphene has paved the way for intense research into 2D materials which is expected to have a tremendous impact on our knowledge of material properties in small dimensions. Among other materials, boron nitride (BN) nanomaterials have shown remarkable features with the possibility of being used in a large variety of devices. Photonics, aerospace, and medicine are just some of the possible fields where BN has been successfully employed. Poor scalability represents, however, a primary limit of boron nitride. Techniques to limit the number of defects, obtaining large area sheets and the production of significant amounts of homogenous 2D materials are still at an early stage. In most cases, the synthesis process governs defect formation. It is of utmost importance, therefore, to achieve a deep understanding of the mechanism behind the creation of these defects. We reviewed some of the most recent studies on 2D and 0D boron nitride materials. Starting with the theoretical works which describe the correlations between structure and defects, we critically described the main BN synthesis routes and the properties of the final materials. The main results are summarized to present a general outlook on the current state of the art in this field.

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Section: Making Of 2d Bn Materialsmentioning

confidence: 99%

From 2-D to 0-D Boron Nitride Materials, The Next Challenge

2019

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“…In RF sputtering of BCN films, the main parameters are gas flow rate (N 2 ), deposition temperature, sputtering power, annealing temperature and bias voltage. 151 The substrate temperature and bias voltage variation provides control over bond contents in BCN films. The increase of N 2 flow decreases elastic modulus, wear resistance and hardness in BCN films.…”

Section: Synthesis Of Bcnmentioning

confidence: 99%

Recent insights into BCN nanomaterials – synthesis, properties and applications

et al. 2023

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“…Sputtering is a physical vapor deposition procedure with a high film deposition rate and low-temperature structures, making it a good technique [67,68]. It is fast and inexpensive to create thin films of alloys, metals, nitrides, carbides, and oxides [69][70][71].…”

Section: B Sputtering Techniquesmentioning

confidence: 99%

“…The integrated pulse energy, time of deposition, pressure in the chamber, plasma gas, target-to-substrate angle, and substrate temperature are all crucial elements in diminishing dopant redistribution and defect creation during high-temperature processing. There are several types of high-quality thin films, such as boron carbon nitride [68], aluminum oxide [75], gallium oxide [76], and others [77], deposited via the magnetron sputtering technique [67]. For readers interested in the history of the thin-film sputter deposition process, we recommend consulting the reference [78].…”

Section: B Sputtering Techniquesmentioning

confidence: 99%

Optical Thin Films Fabrication Techniques—Towards a Low-Cost Solution for the Integrated Photonic Platform: A Review of the Current Status

et al. 2022

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In the past few decades, several methods concerning optical thin films have been established to facilitate the development of integrated optics. This paper provides a brief depiction of different techniques for implementing optical waveguide thin films that involve chemical, physical, and refractive index modification methods. Recent advances in these fabrication methods are also been presented. Most of the methods developed for the realization of the thin-films are quite efficient, but they are expensive and require sophisticated equipment. The major interest of the scientists is to develop simple and cost-effective methods for mass production of optical thin films resulting in the effective commercialization of the waveguide technology. Our research group is focused on developing a silica-titania optical waveguide platform via the sol-gel dip-coating method and implementing active and passive optical elements via the wet etching method. We are also exploring the possibility of using nanoimprint lithography (NIL) for patterning these films so that the fabrication process is efficient and economical. The recent developments of this platform are discussed. We believe that silica-titania waveguide technology developed via the sol-gel dip-coating method is highly attractive and economical, such that it can be commercialized for applications such as sensing and optical interconnects.

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A brief overview of RF sputtering deposition of boron carbon nitride (BCN) thin films

Cited by 21 publications

References 124 publications

From 2-D to 0-D Boron Nitride Materials, The Next Challenge

From 2-D to 0-D Boron Nitride Materials, The Next Challenge

Recent insights into BCN nanomaterials – synthesis, properties and applications

Optical Thin Films Fabrication Techniques—Towards a Low-Cost Solution for the Integrated Photonic Platform: A Review of the Current Status

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