2017
DOI: 10.1016/j.nimb.2017.02.060
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Measurements of multiple scattering of high energy protons in bent silicon crystals

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Cited by 8 publications
(8 citation statements)
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“…They showed that there is additional scattering of the protons on material in the beam (strip detectors and other matter). Background measurements in the experiment performed without a crystal show that the contribution of this background process can be described by a Gaussian with rms σ bg = 5 µrad for a 400 GeV/c proton [18] and σ bg = 11.27 µrad [6] for 180 GeV/c secondary beams. As explained in [5,6,18] the measured σ m and corrected σ si rms of angles of multiple scattering are determined by the relation:…”
Section: About Experiments With Focusing Crystalsmentioning
confidence: 98%
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“…They showed that there is additional scattering of the protons on material in the beam (strip detectors and other matter). Background measurements in the experiment performed without a crystal show that the contribution of this background process can be described by a Gaussian with rms σ bg = 5 µrad for a 400 GeV/c proton [18] and σ bg = 11.27 µrad [6] for 180 GeV/c secondary beams. As explained in [5,6,18] the measured σ m and corrected σ si rms of angles of multiple scattering are determined by the relation:…”
Section: About Experiments With Focusing Crystalsmentioning
confidence: 98%
“…The variable x was from -1 to 1 mm for crystals 1 and 2, and from -2 to 2 mm for crystal 4 (x 0 ≈ 0). It should be noted that our collaboration (UA9) has carried out measurements of multiple scattering of 400 GeV/c protons [18] in single silicon crystals with orientations far from axial or planar channeling. That experiment was performed in parallel and at the same time and on the same installation as the experiments described here with focusing crystals.…”
Section: About Experiments With Focusing Crystalsmentioning
confidence: 99%
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